SCHEMBL43023

SCHEMBL43023

Cc1ccc(N(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.56
TDP1 Q9NUW8 3/20 0.56
CYP2C19 P33261 2/20 0.56
L3MBTL1 Q9Y468 2/20 0.56
KDM4E B2RXH2 1/20 0.56
CYP1A2 P05177 1/20 0.56
CYP3A4 P08684 1/20 0.56
CYP2D6 P10635 1/20 0.56
MAPT P10636 1/20 0.56
CYP2C9 P11712 1/20 0.56
TSHR P16473 4/20 0.53
ACHE P22303 2/20 0.53
LMNA P02545 1/20 0.53
ALOX12 P18054 1/20 0.53
CA12 O43570 1/20 0.47
CA9 Q16790 1/20 0.47
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
CRHBP P24387 1/20 0.46
ATM Q13315 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10109344 1.00 ALDH1A1 (0.56) ALDH1A1TDP1CYP2C19L3MBTL1KDM4E
SCHEMBL13515157 1.00 ALDH1A1 (0.56) ALDH1A1TDP1CYP2C19L3MBTL1KDM4E
SCHEMBL57176 1.00 ALDH1A1 (0.56) ALDH1A1TDP1CYP2C19L3MBTL1KDM4E
SCHEMBL261308 1.00 ALDH1A1 (0.56) ALDH1A1TDP1CYP2C19L3MBTL1KDM4E
SCHEMBL6139963 1.00 ALDH1A1 (0.56) ALDH1A1TDP1CYP2C19L3MBTL1KDM4E
SCHEMBL10065556 1.00 ALDH1A1 (0.56) ALDH1A1TDP1CYP2C19L3MBTL1KDM4E
SCHEMBL12154508 1.00 ALDH1A1 (0.56) ALDH1A1TDP1CYP2C19L3MBTL1KDM4E
SCHEMBL13990423 1.00 ALDH1A1 (0.56) ALDH1A1TDP1CYP2C19L3MBTL1KDM4E
SCHEMBL16707568 1.00 ALDH1A1 (0.56) ALDH1A1TDP1CYP2C19L3MBTL1KDM4E
SCHEMBL12831506 1.00 ALDH1A1 (0.56) ALDH1A1TDP1CYP2C19L3MBTL1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3049 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260126724-A1 SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2026-05-07 US claimed
EP-4607278-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT Ycchem Co., Ltd. (KR) 2025-08-27 EP claimed
US-20250199405-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT YCCHEM CO., LTD. (KR) 2025-06-19 US claimed
CN-119998727-A Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance YC化学制品株式会社 2025-05-13 CN claimed
CN-118978671-B Preparation method and application of iron-based poly-lattice molecular catalyst 南京邮电大学 2025-04-15 CN claimed
CN-118979269-A Iron-based A-type lattice molecular catalyst and preparation method and application thereof 南京邮电大学 2024-11-19 CN claimed
CN-118978671-A Preparation method and application of iron-based poly-lattice molecular catalyst 南京邮电大学 2024-11-19 CN claimed
US-20240288771-A1 SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-08-29 US claimed
WO-2024085293-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT 영창케미칼 주식회사 2024-04-25 WO claimed
CN-103509016-B Bipyridine fluorene derivatives, preparation method and application thereof, and electroluminescent device TCL GROUP CO LTD 2015-05-20 CN claimed
US-7727707-B2 Barrier film material and pattern formation method using the same PANASONIC CORPORATION (JP) 2010-06-01 US claimed
CN-101172954-A Compound for electroluminescent organic material and method for producing the same SHANGHAI TUOYIN DIGITAL TECHNO (CN) 2008-05-07 CN claimed
CN-1911897-A Method of synthesizing TPD kind photoelectric material HANDAN OPTICAL GUIDE HEAVY IND (CN) 2007-02-14 CN claimed
US-7135273-B2 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-11-14 US claimed
US-20060127812-A1 Barrier film material and pattern formation method using the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2006-06-15 US claimed
EP-1669804-A2 Barrier film material and pattern formation method using the same Matsushita Electric Industries Co., Ltd. (JP) 2006-06-14 EP claimed
US-20040259040-A1 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2004-12-23 US claimed
US-6558624-B1 Sensitive spectroscopic detection of adsorbed small scale samples GENERAL ELECTRIC COMPANY 2003-05-06 US claimed
WO-2002008731-A1 METHOD AND ANALYTICAL SYSTEM FOR RAPID SCREENING OF COMBINATORIAL LIBRARIES GENERAL ELECTRIC COMPANY A CORPORATION OF THE STATE OF NEW YORK (US) 2002-01-31 WO claimed
US-5648542-A COPPER CATALYST XEROX CORPORATION (US) 1997-07-15 US claimed