Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL4307387

COc1ccc([S+]2CCCC2)c2ccccc12.O=S(=O)(O)C(F)(F)F.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.36

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Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
SLC2A1 P11166 1/20 0.32
ALDH1A1 P00352 1/20 0.31
NPC1 O15118 1/20 0.30
FABP4 P15090 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL4307394 0.95 ALDH1A1 (0.32) ALDH1A1NPC1
SCHEMBL702251 0.95 ALDH1A1 (0.33) SLC2A1ALDH1A1NPC1
Trifluoromethanesulfonic Acid SCHEMBL4307390 0.94 SLC2A1 (0.32) SLC2A1ALDH1A1NPC1FABP4
SCHEMBL704509 0.94 ALDH1A1 (0.33) SLC2A1ALDH1A1NPC1
Trifluoromethanesulfonic Acid SCHEMBL31168290 0.86 ALDH1A1 (0.37) SLC2A1ALDH1A1NPC1
Trifluoromethanesulfonic Acid SCHEMBL36502 0.86 ALDH1A1 (0.37) SLC2A1ALDH1A1NPC1
SCHEMBL3159376 0.86 HTT (0.33) SLC2A1ALDH1A1
SCHEMBL3150425 0.85 CA1 (0.31)
SCHEMBL3168087 0.85 HTT (0.32) SLC2A1ALDH1A1
SCHEMBL5365271 0.85

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090023097-A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2009-01-22 US disclosed