SCHEMBL431916

SCHEMBL431916

C=C(CCCCC(=O)O)C(=O)O

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.61
TSHR P16473 4/20 0.58
NFKB1 P19838 2/20 0.58
PMP22 Q01453 1/20 0.58
SLC22A6 Q4U2R8 2/20 0.53
GPR84 Q9NQS5 4/20 0.48
FFAR1 O14842 2/20 0.48
FFAR4 Q5NUL3 2/20 0.48
AKR1B1 P15121 1/20 0.48
CYP2D6 P10635 1/20 0.48
FOLH1 Q04609 1/20 0.48
ABCC4 O15439 1/20 0.46
MAPT P10636 1/20 0.46
PPARG P37231 5/20 0.46
PPARD Q03181 5/20 0.46
PPARA Q07869 5/20 0.46
HDAC11 Q96DB2 4/20 0.46
ALDH1A1 P00352 2/20 0.46
TLR2 O60603 2/20 0.46
TDP1 Q9NUW8 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2994334 0.97 TSHR (0.63) LMNATSHRNFKB1PMP22SLC22A6
SCHEMBL156052 0.97 TSHR (0.63) LMNATSHRNFKB1PMP22SLC22A6
SCHEMBL699958 0.97 TSHR (0.63) LMNATSHRNFKB1PMP22SLC22A6
SCHEMBL3505291 0.97 TSHR (0.63) LMNATSHRNFKB1PMP22SLC22A6
SCHEMBL33625 0.94 SLC22A6 (0.61) LMNATSHRNFKB1PMP22SLC22A6
SCHEMBL2025802 0.91 TBXAS1 (0.47) LMNATSHRNFKB1PMP22SLC22A6
SCHEMBL3959909 0.90 SLC22A6 (0.55) LMNATSHRNFKB1PMP22SLC22A6
SCHEMBL11122641 0.88 TBXAS1 (0.50) LMNATSHRNFKB1PMP22SLC22A6
SCHEMBL1860769 0.88 TBXAS1 (0.50) LMNATSHRNFKB1PMP22SLC22A6
SCHEMBL3125930 0.88 TBXAS1 (0.50) LMNATSHRNFKB1PMP22SLC22A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 244 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080299479-A1 Toner compositions XEROX CORPORATION 2008-12-04 US claimed
EP-0397375-B1 Photosensitive composition and photosensitive lithographic printing plate KONISHIROKU PHOTO IND (JP) 1994-04-06 EP claimed
EP-0397375-A1 Photosensitive composition and photosensitive lithographic printing plate KONICA CORPORATION (JP) 1990-11-14 EP claimed
EP-4590731-A1 GRAFTED POLYMER OF MONO-UNSATURATED POLYCARBOXYLIC ACID AS DYEING AUXILIARY OR AS RE-TANNING AGENT FOR LEATHER Stahl International B.V. (NL) 2025-07-30 EP disclosed
CN-120092032-A Graft polymers of monounsaturated polycarboxylic acids as dyeing auxiliaries or retanning agents for leather 斯塔尔国际有限公司 2025-06-03 CN disclosed
EP-2588219-B1 FILTER PLATE ARTICLE HAVING A WATER-ABSORBENT FILTER ASSEMBLY NEOGEN FOOD SAFETY US HOLDCO CORP (US) 2024-05-29 EP disclosed
WO-2024063646-A1 GRAFTED POLYMER OF MONO-UNSATURATED POLYCARBOXYLIC ACID AS DYEING AUXILIARY OR AS RE-TANNING AGENT FOR LEATHER STAHL INTERNATIONAL B.V. (NL) 2024-03-28 WO disclosed
WO-2023248020-A1 BLOCK COPOLYMERS GRAFTED TO POROUS POLYMERIC SUBSTRATE 3M INNOVATIVE PROPERTIES COMPANY (US) 2023-12-28 WO disclosed
US-20230036031-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, METHOD FOR PRODUCING PLATED FORMED PRODUCT, AND METHOD FOR PRODUCING TIN-SILVER PLATED-FORMED PRODUCT JSR CORPORATION (JP) 2023-02-02 US disclosed
US-20220057714-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED FORMED PRODUCT JSR CORPORATION (JP) 2022-02-24 US disclosed
US-20220035246-A1 METHOD FOR PRODUCING PLATED FORMED PRODUCT JSR CORPORATION (JP) 2022-02-03 US disclosed
US-20050261384-A1 MACROPOROUS ION EXCHANGE RESINS 3M INNOVATIVE PROPERTIES COMPANY 2005-11-24 US disclosed
US-20050095527-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-05 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed
EP-0989162-A1 THERMOPLASTIC RESIN COMPOSITION, WATER-BASED COMPOSITION, HEAT-SENSITIVE PRESSURE-SENSITIVE ADHESIVE, AND HEAT-SENSITIVE SHEET Daicel Chemical Industries, Ltd. (JP) 2000-03-29 EP disclosed
EP-0989168-A1 Water-based coating composition Daicel Chemical Industries, Ltd. (JP) 2000-03-29 EP disclosed
EP-0397375-B1 Photosensitive composition and photosensitive lithographic printing plate KONISHIROKU PHOTO IND (JP) 1994-04-06 EP disclosed
US-5260161-A Developability after storage for long time, press life, and ink attachibility KONICA CORPORATION (JP) 1993-11-09 US disclosed
EP-0397375-A1 Photosensitive composition and photosensitive lithographic printing plate KONICA CORPORATION (JP) 1990-11-14 EP disclosed
US-4963631-A Corrosion resistance, antiscaling agent; protective coatings CIBA-GEIGY CORPORATION (US) 1990-10-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080299479-A1 Toner compositions TECR, EWSR1, QARS1 LMNA 3108/4885TSHR 1689/4885NFKB1 4120/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.