Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19705393 | 0.94 | — | — | |
| SCHEMBL6865189 | 0.90 | SMN1; SMN2 (0.35) | ALDH1A1TSHRSMN1; SMN2 | |
| SCHEMBL14159018 | 0.87 | LMNA (0.38) | ALDH1A1TSHRSMN1; SMN2 | |
| SCHEMBL9193298 | 0.86 | — | — | |
| SCHEMBL27715014 | 0.82 | — | — | |
| SCHEMBL3628938 | 0.78 | CYP2C19 (0.46) | ALDH1A1TSHRMAPTSMN1; SMN2 | |
| SCHEMBL122628 | 0.77 | — | — | |
| SCHEMBL25775735 | 0.76 | MAPT (0.30) | MAPT | |
| SCHEMBL13154479 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL5391210 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8084184-B2 | Composition for removing photoresist and method of manufacturing an array substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-12-27 | — | — | US | claimed |
| US-20090170037-A1 | COMPOSITION FOR REMOVING PHOTORESIST AND METHOD OF MANUFACTURING AN ARRAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-07-02 | — | — | US | claimed |
| EP-1154868-A4 | NON-CORROSIVE CLEANING COMPOSITION AND METHOD FOR REMOVING PLASMA ETCHING RESIDUES | ARCH SPEC CHEM INC (US) | 2004-03-24 | — | — | EP | claimed |
| EP-1154868-A1 | NON-CORROSIVE CLEANING COMPOSITION AND METHOD FOR REMOVING PLASMA ETCHING RESIDUES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2001-11-21 | — | — | EP | claimed |
| US-6103680-A | COMPRISING A HYDROXY-(LOWER ALKYL)-HYDRAZINE, WATER, AND AT LEAST ONE CARBOXYLIC ACID SELECTED FROM CITRIC ACID, LACTIC ACID, SUCCINIC ACID, TARTARIC ACID, ETHYLENEDIAMINETETRAACETIC ACID, NITRILOTRIACETIC ACID | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-08-15 | — | — | US | claimed |
| WO-2000040347-A1 | NON-CORROSIVE CLEANING COMPOSITION AND METHOD FOR REMOVING PLASMA ETCHING RESIDUES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-07-13 | — | — | WO | claimed |
| WO-1996004223-A1 | REDUCED VOLATILITY SUBSTITUTED HYDRAZINE COMPOUNDS IN LIQUID PROPELLANTS | OLIN CORPORATION (US) | 1996-02-15 | — | — | WO | claimed |
| US-5433802-A | Hydroxy or cyano substituted hydrazines, nitrogen oxide oxidizers | OLIN CORPORATION (US) | 1995-07-18 | — | — | US | claimed |
| US-8084184-B2 | Composition for removing photoresist and method of manufacturing an array substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-12-27 | — | — | US | disclosed |
| US-20090170037-A1 | COMPOSITION FOR REMOVING PHOTORESIST AND METHOD OF MANUFACTURING AN ARRAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-07-02 | — | — | US | disclosed |
| EP-1154868-A4 | NON-CORROSIVE CLEANING COMPOSITION AND METHOD FOR REMOVING PLASMA ETCHING RESIDUES | ARCH SPEC CHEM INC (US) | 2004-03-24 | — | — | EP | disclosed |
| EP-1154868-A1 | NON-CORROSIVE CLEANING COMPOSITION AND METHOD FOR REMOVING PLASMA ETCHING RESIDUES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2001-11-21 | — | — | EP | disclosed |
| US-6103680-A | COMPRISING A HYDROXY-(LOWER ALKYL)-HYDRAZINE, WATER, AND AT LEAST ONE CARBOXYLIC ACID SELECTED FROM CITRIC ACID, LACTIC ACID, SUCCINIC ACID, TARTARIC ACID, ETHYLENEDIAMINETETRAACETIC ACID, NITRILOTRIACETIC ACID | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-08-15 | — | — | US | disclosed |
| WO-2000040347-A1 | NON-CORROSIVE CLEANING COMPOSITION AND METHOD FOR REMOVING PLASMA ETCHING RESIDUES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-07-13 | — | — | WO | disclosed |
| WO-1996004223-A1 | REDUCED VOLATILITY SUBSTITUTED HYDRAZINE COMPOUNDS IN LIQUID PROPELLANTS | OLIN CORPORATION (US) | 1996-02-15 | — | — | WO | disclosed |
| US-5433802-A | Hydroxy or cyano substituted hydrazines, nitrogen oxide oxidizers | OLIN CORPORATION (US) | 1995-07-18 | — | — | US | disclosed |