Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | GAA | P10253 | 2/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.47 |
| ▸ | LMNA | P02545 | 3/20 | 0.47 |
| ▸ | RAB9A | P51151 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.47 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | MGAM | O43451 | 1/20 | 0.39 |
| ▸ | SI | P14410 | 1/20 | 0.39 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.39 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL28042444 | 0.90 | — | — | |
| SCHEMBL80284 | 0.87 | — | — | |
| Water SCHEMBL28847958 | 0.85 | — | — | |
| Ammonia Solution, Strong SCHEMBL28740670 | 0.85 | — | — | |
| Lithium SCHEMBL29979474 | 0.85 | — | — | |
| SCHEMBL11702670 | 0.85 | — | — | |
| Hydrochloric Acid SCHEMBL28746809 | 0.85 | ALDH1A1 (0.50) | GAAALDH1A1LMNAHPGDKMT2A | |
| Bromide SCHEMBL8637682 | 0.85 | — | — | |
| Hydrochloric Acid SCHEMBL28166160 | 0.85 | — | — | |
| SCHEMBL27854464 | 0.85 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 253 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240240024-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, AND COLOR FILTER | SAMSUNG SDI CO., LTD. (KR) | 2024-07-18 | — | — | US | disclosed |
| EP-4394001-A1 | REACTIVE DYE AND PHOTOSENSITIVE COMPOSITION USING SAME | Duksan Neolux Co., Ltd (KR) | 2024-07-03 | — | — | EP | disclosed |
| US-12019369-B2 | Coloring composition, color filter, pattern forming method, solid-stage imaging element, and image display device | FUJIFILM CORPORATION (JP) | 2024-06-25 | — | — | US | disclosed |
| US-20240199999-A1 | THINNER COMPOSITION FOR REMOVING PHOTOSENSITIVE RESIN INCLUDING COLORANT | DUK SAN NEOLUX CO., LTD. (KR) | 2024-06-20 | — | — | US | disclosed |
| US-20240206224-A1 | METHOD FOR PREPARING PIXEL DEFINE LAYER | DUK SAN NEOLUX CO., LTD. (KR) | 2024-06-20 | — | — | US | disclosed |
| US-20240196661-A1 | METHOD FOR PREPARING PIXEL DEFINE LAYER | DUK SAN NEOLUX CO., LTD. (KR) | 2024-06-13 | — | — | US | disclosed |
| US-20240192589-A1 | METHOD FOR PREPARING PIXEL DEFINE LAYER | DUK SAN NEOLUX CO., LTD. (KR) | 2024-06-13 | — | — | US | disclosed |
| US-20240192594-A1 | METHOD FOR PREPARING PIXEL DEFINE LAYER | DUK SAN NEOLUX CO., LTD. (KR) | 2024-06-13 | — | — | US | disclosed |
| US-20240176232-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER | SAMSUNG SDI CO., LTD. (KR) | 2024-05-30 | — | — | US | disclosed |
| US-20240179943-A1 | METHOD FOR PREPARING PIXEL DEFINE LAYER | DUK SAN NEOLUX CO., LTD. (KR) | 2024-05-30 | — | — | US | disclosed |
| US-20110006386-A1 | Organic-Inorganic Hybrid Composition and Image Sensor | CHEIL INDUSTRIES INC. (KR) | 2011-01-13 | — | — | US | disclosed |
| EP-2264074-A1 | POLYMERIZABLE COMPOSITION, COLOR FILTER, METHOD FOR PRODUCING COLOR FILTER, AND SOLID-STATE IMAGING DEVICE | FUJIFILM Corporation (JP) | 2010-12-22 | — | — | EP | disclosed |
| US-7851789-B2 | Photosensitive resin composition for pad protective layer, and method for making image sensor using the same | CHEIL INDUSTRIES INC. (KR) | 2010-12-14 | — | — | US | disclosed |
| US-20100167188-A1 | Pigment Dispersion Composition, Resist Composition for Color Filter Including the Same, and Color Filter Using the Same | CHEIL INDUSTRIES INC. (KR) | 2010-07-01 | — | — | US | disclosed |
| WO-2010050650-A1 | PIGMENT DISPERSION COMPOSITION AND COLOR RESIST COMPOSITION INCLUDING THE SAME AND COLOR FILTER USING THE SAME | CHEIL INDUSTRIES INC. (KR) | 2010-05-06 | — | — | WO | disclosed |
| US-20090146236-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PAD PROTECTIVE LAYER, AND METHOD FOR MAKING IMAGE SENSOR USING THE SAME | CHEIL INDUSTRIES INC. (KR) | 2009-06-11 | — | — | US | disclosed |
| US-20090140220-A1 | Photosensitive Resin Composition for Color Filter and Color Filter Using Same | CHEIL INDUSTRIES INC. (KR) | 2009-06-04 | — | — | US | disclosed |
| WO-2009035189-A1 | PIGMENT DISPERSION COMPOSITION, RESIST COMPOSITION FOR COLOR FILTER INCLUDING THE SAME, AND COLOR FILTER USING THE SAME | CHEIL INDUSTRIES INC. (KR) | 2009-03-19 | — | — | WO | disclosed |
| US-20070160776-A1 | INK COMPOSITION, DISPLAY PANEL COMPRISING THE SAME, AND MANUFACTURING METHOD THEREOF | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-07-12 | — | — | US | disclosed |
| US-20070099094-A1 | Method for producing color filter for image sensor | FUJIFILM CORPORATION (JP) | 2007-05-03 | — | — | US | disclosed |