SCHEMBL433513

SCHEMBL433513

CC/C=C(\OC)O/C(=C/CC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5166898 0.88
SCHEMBL6721282 0.88
SCHEMBL9395487 0.80
SCHEMBL7536204 0.78
SCHEMBL6127996 0.78
SCHEMBL3815138 0.78 BACE1 (0.32)
SCHEMBL6817189 0.76 ALDH1A1 (0.46)
SCHEMBL6817181 0.76 ALDH1A1 (0.46)
SCHEMBL12971207 0.74 SOAT1 (0.38)
SCHEMBL4942105 0.74 SOAT1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 146 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260040695-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NEWSOUTH INNOVATIONS PTY LTD (AU) 2026-02-05 US claimed
EP-4562077-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NewSouth Innovations Pty Limited (AU) 2025-06-04 EP claimed
WO-2024020649-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NEWSOUTH INNOVATIONS PTY LIMITED (AU) 2024-02-01 WO claimed
WO-2022261721-A1 HEALABLE AND REPROCESSABLE COMPOSITIONS DEAKIN UNIVERSITY (AU) 2022-12-22 WO claimed
EP-2481760-B1 INITIATOR SYSTEM FOR CATIONIC POLYMERIZATION AND POLYMERIZATION METHOD USING SAME CHINA PETROLEUM & CHEM CORP (CN) 2021-05-05 EP claimed
US-20260040695-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NEWSOUTH INNOVATIONS PTY LTD (AU) 2026-02-05 US disclosed
EP-3665172-B1 COMPOUNDS AS POTENTIAL DYE MOLECULES Lleaf Pty Ltd (AU) 2025-03-19 EP disclosed
CN-112987515-B Method of manufacturing semiconductor device and semiconductor device manufacturing tool 台湾积体电路制造股份有限公司 2024-09-06 CN disclosed
CN-118444522-A Dose-reducing bottom antireflective coating for metallic photoresists 台湾积体电路制造股份有限公司 2024-08-06 CN disclosed
CN-118169970-A Method for manufacturing semiconductor device and CMOS image sensor 台湾积体电路制造股份有限公司 2024-06-11 CN disclosed
CN-113805435-B Photoresist and method 台湾积体电路制造股份有限公司 2024-05-28 CN disclosed
US-11898046-B2 Photopolymerization initiator and producing method thereof, polymerizable composition, ink jet recording method, and acylphosphine oxide compound FUJIFILM CORPORATION (JP) 2024-02-13 US disclosed
EP-0332165-A2 Silver halide color reversal photographic light-sensitive material Fuji Photo Film Co., Ltd. (JP) 1989-09-13 EP disclosed
US-4788055-A Resinate sustained release dextromethorphan composition CIBA-GEIGY CORPORATION (US) 1988-11-29 US disclosed
US-4745048-A CONTAINING MAGNETA POLYMER COUPLER FUJI PHOTO FILM CO., LTD. (JP) 1988-05-17 US disclosed
EP-0246653-A2 Delayed/sustained release of macromolecules SYNTEX (U.S.A.) INC. (US) 1987-11-25 EP disclosed
EP-0206049-A2 Silver halide color photographic material and method of processing the same FUJI PHOTO FILM CO., LTD. (JP) 1986-12-30 EP disclosed
EP-0190996-A2 Crosslinked, porous polymers for controlled delivery of agricultural ingredients CIBA-GEIGY AG (CH) 1986-08-13 EP disclosed
US-4576911-A MAGENTA DYE-FORMING POLYMER COUPLER WITH HALOPHENYLPYRAZOLONE GROUP KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1986-03-18 US disclosed
US-4548990-A HIGH DEGREE OF SWELLING IN ORGANIC SOLVENTS CIBA-GEIGY CORPORATION (US) 1985-10-22 US disclosed