SCHEMBL4340667

SCHEMBL4340667

c1ccc(-c2ccc(-c3ccccc3-c3ccccc3)o2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NQO2 P16083 3/20 0.47
CYP2A6 P11509 3/20 0.47
CYP2E1 P05181 2/20 0.47
CYP3A4 P08684 2/20 0.47
CYP2D6 P10635 2/20 0.47
CYP2C9 P11712 2/20 0.47
CYP2B6 P20813 2/20 0.47
CYP2C19 P33261 2/20 0.47
ALDH1A1 P00352 6/20 0.44
HPGD P15428 4/20 0.44
GFER P55789 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
HSD17B10 Q99714 4/20 0.42
CYP1A2 P05177 2/20 0.42
CASP1 P29466 1/20 0.42
CASP7 P55210 1/20 0.42
BCL2L1 Q07817 1/20 0.41
MAPK1 P28482 1/20 0.41
CHRM2 P08172 1/20 0.41
CHRM4 P08173 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4344554 0.95 ALDH1A1 (0.44) NQO2CYP2A6CYP2E1CYP3A4CYP2D6
SCHEMBL76097 0.84 CYP2E1 (0.58) NQO2CYP2A6CYP2E1CYP3A4CYP2D6
SCHEMBL13539334 0.84 NQO2 (0.41) NQO2CYP2A6CYP2E1CYP3A4CYP2D6
SCHEMBL28311858 0.80 ALDH1A1 (0.52) NQO2CYP2A6CYP2E1CYP3A4CYP2D6
SCHEMBL4340657 0.79 ALDH1A1 (0.61) NQO2CYP2A6CYP2E1CYP3A4CYP2D6
SCHEMBL4344550 0.79 ALDH1A1 (0.61) NQO2CYP2A6CYP2E1CYP3A4CYP2D6
SCHEMBL14179929 0.77 CYP2E1 (0.52) NQO2CYP2A6CYP2E1CYP3A4CYP2D6
SCHEMBL4347437 0.77 ALDH1A1 (0.49) NQO2CYP3A4CYP2D6CYP2C9CYP2B6
SCHEMBL30430245 0.77 ALDH1A1 (0.49) NQO2CYP3A4CYP2D6CYP2C9CYP2B6
Benzene SCHEMBL28035419 0.76 ALDH1A1 (0.61) CYP2A6ALDH1A1HPGDHSD17B10BCL2L1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7611818-B2 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-11-03 US claimed
US-7611818-B2 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-11-03 US disclosed
US-20070077514-A1 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2007-04-05 US disclosed