⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3901427 | 0.76 | — | — | |
| SCHEMBL9156224 | 0.65 | APLNR (0.36) | — | |
| SCHEMBL10704818 | 0.65 | — | — | |
| SCHEMBL5697371 | 0.65 | — | — | |
| SCHEMBL6325091 | 0.64 | ESR1 (0.32) | — | |
| SCHEMBL6325086 | 0.64 | ESR1 (0.32) | — | |
| SCHEMBL3112772 | 0.63 | ESR2 (0.45) | — | |
| Butadiene SCHEMBL8946896 | 0.63 | — | — | |
| SCHEMBL1815106 | 0.63 | ESR1 (0.31) | — | |
| SCHEMBL3025238 | 0.62 | APLNR (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2006024885-A1 | PROCESS FOR THE PREPARATION OF POLYISOCYANATE/POLYSILICIC ACID BASED POLYADDITION AND HYBRID RESINS USING BLOCKED POLYISO-CYANATES AND BLOCKED POLYISOCYANATES USABLE IN THE PROCESS | POLINVENT FEJLESZTO, KIVITELEZO ÉS ÉRTÉKESÍTO KFT (HU) | 2006-03-09 | — | — | WO | claimed |
| EP-3674335-B1 | POLYMER BASED ON (METH)ACRYLIC ACID ALKYL ESTER AND USE THEREOF | SOKEN KAGAKU KK (JP) | 2024-01-03 | — | — | EP | disclosed |
| CN-111448280-B | Photosensitizing agent and active energy ray-curable composition | 积水化学工业株式会社 | 2023-10-27 | — | — | CN | disclosed |
| US-11673994-B2 | Photosensitizer and active energy ray-curable composition | SEKISUI CHEMICAL CO., LTD. (JP) | 2023-06-13 | — | — | US | disclosed |
| US-11634523-B2 | (Meth)acrylic acid alkyl ester polymer and use thereof | SOKEN CHEMICAL & ENGINEERING CO., LTD. (JP) | 2023-04-25 | — | — | US | disclosed |
| CN-111032712-B | Alkyl (meth) acrylate polymer and use thereof | 综研化学株式会社 | 2022-08-30 | — | — | CN | disclosed |
| EP-3998309-A1 | CURABLE COMPOSITION AND CURED PRODUCT | Soken Chemical & Engineering Co., Ltd. (JP) | 2022-05-18 | — | — | EP | disclosed |
| CN-114080423-A | Curable composition and cured product | 综研化学株式会社 | 2022-02-22 | — | — | CN | disclosed |
| WO-2021006088-A1 | CURABLE COMPOSITION AND CURED PRODUCT | 綜研化学株式会社 | 2021-01-14 | — | — | WO | disclosed |
| EP-3750968-A1 | PHOTOSENSITIZER AND ACTIVE ENERGY RAY-CURABLE COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 2020-12-16 | — | — | EP | disclosed |
| US-20030026979-A1 | Sheet-form, curable pressure-sensitive adhesive | SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA | 2003-02-06 | — | — | US | disclosed |
| EP-1270636-A1 | PHOTOCURABLE COMPOSITION, PROCESS FOR PRODUCING PHOTOCURABLE COMPOSITION, PHOTOCURABLE PRESSURE-SENSITIVE ADHESIVE SHEET, PROCESS FOR PRODUCING PHOTOCURABLE PRESSURE-SENSITIVE ADHESIVE SHEET, AND METHOD OF BONDING | SEKISUI CHEMICAL CO., LTD. (JP) | 2003-01-02 | — | — | EP | disclosed |
| EP-1249479-A2 | Method for joining members | SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2002-10-16 | — | — | EP | disclosed |
| EP-1209212-A1 | ADHESIVE COMPOSITION AND METHOD OF BONDING WITH THE ADHESIVE COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 2002-05-29 | — | — | EP | disclosed |
| US-6376070-B1 | BLEND OF ACRYLIC POLYMER, PHOTOPOLYMERIZABLE COMPOUND AND PHOTOINITIATORS | SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2002-04-23 | — | — | US | disclosed |
| EP-0819746-A2 | Sheet form, curable pressure-sensitive adhesive | SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1998-01-21 | — | — | EP | disclosed |
| EP-0629613-B1 | Novel onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product | NIPPON KAYAKU KK (JP) | 1997-10-15 | — | — | EP | disclosed |
| US-5534557-A | COATINGS | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1996-07-09 | — | — | US | disclosed |
| US-5502083-A | SULFONIUM CATALYST | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1996-03-26 | — | — | US | disclosed |
| EP-0629613-A2 | Novel onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1994-12-21 | — | — | EP | disclosed |