SCHEMBL4353580

SCHEMBL4353580

O=C(O)C1=CC(=S(=O)=O)CC(C(=O)O)=C1

nearest known ligand 0.31

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
GABRP O00591 1/20 0.31
GABRD O14764 1/20 0.31
GABRA1 P14867 1/20 0.31
TSHR P16473 1/20 0.31
GABRB1 P18505 1/20 0.31
GABRG2 P18507 1/20 0.31
GABRR1 P24046 1/20 0.31
GABRB3 P28472 1/20 0.31
GABRA5 P31644 1/20 0.31
GABRA3 P34903 1/20 0.31
GABRA2 P47869 1/20 0.31
GABRB2 P47870 1/20 0.31
GABRA4 P48169 1/20 0.31
GABRE P78334 1/20 0.31
GABRA6 Q16445 1/20 0.31
GABRG1 Q8N1C3 1/20 0.31
GABRG3 Q99928 1/20 0.31
GABRQ Q9UN88 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phosphine SCHEMBL9617563 0.98
SCHEMBL6544012 0.72 GABRP (0.33) GABRPGABRDGABRA1TSHRGABRB1
SCHEMBL1286825 0.63 TSHR (0.40) GABRPGABRDGABRA1TSHRGABRB1
SCHEMBL8774891 0.61
SCHEMBL1793451 0.61
SCHEMBL1812431 0.60 TSHR (0.33) GABRPGABRDGABRA1TSHRGABRB1
SCHEMBL1355416 0.60 TSHR (0.42) GABRPGABRDGABRA1TSHRGABRB1
SCHEMBL3396869 0.58 TSHR (0.36) GABRPGABRDGABRA1TSHRGABRB1
SCHEMBL8132463 0.57
Hydrochloric Acid SCHEMBL7218922 0.57 BLM (0.38) GABRPGABRDGABRA1TSHRGABRB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118459955-A High-crystallization-temperature polyester material based on in-situ nucleation and preparation method thereof 山西智创高聚新材料研究院有限公司 2024-08-09 CN claimed
EP-1068379-B1 IMPROVING COMFORT BY MIXING DENIERS DU PONT (US) 2003-01-15 EP claimed
JP-4247064-A None JP disclosed
US-20090075099-A1 Waterborne Coating Compositions for Optical-use Polyester film SHIEH SUNG-YUEH 2009-03-19 US disclosed
US-20080249226-A1 Waterborne coating compositions for optical-use polyester film NAN YA PLASTICS CORPORATION 2008-10-09 US disclosed
EP-1728815-B1 White opaque film with low transparency with high dielectric strength MITSUBISHI POLYESTER FILM GMBH (DE) 2008-07-23 EP disclosed
EP-1436340-B1 ANISOTROPIC MELT-FORMING POLYMERS HAVING A HIGH DEGREE OF STRETCHABILITY TICONA LLC (US) 2007-10-10 EP disclosed
EP-1728815-A1 White opaque film with low transparency with high dielectric strength Mitsubishi Polyester Film GmbH (DE) 2006-12-06 EP disclosed
EP-1436340-A1 ANISOTROPIC MELT-FORMING POLYMERS HAVING A HIGH DEGREE OF STRETCHABILITY Ticona LLC (US) 2004-07-14 EP disclosed
WO-2003018664-A1 ANISOTROPIC MELT-FORMING POLYMERS HAVING A HIGH DEGREE OF STRETCHABILITY TICONA LLC (US) 2003-03-06 WO disclosed
US-6514611-B1 P-hydroxybenzoic acid, 6-hydroxy-2-naphthoic acid, isophthalic acid, terephthalic acid and hydroquinone polyester; films, fibers, sheets, laminates, blow molded forms TICONA LLC 2003-02-04 US disclosed
EP-1082376-B1 MANUFACTURING METHODS, BASED ON NON AQUEOUS DISPERSION TECHNIQUES, TO PRODUCE SPHERICAL POLYESTER PARTICLES WITH NARROW PARTICLE SIZE DISTRIBUTIONS AND TAILORABLE MEAN PARTICLE SIZES TICONA GMBH (DE) 2002-10-16 EP disclosed
US-6365315-B1 ONE STEP EMULSION POLYMERIZATION FROM MONOMERS OR OLIGOESTERS; ANATRON DISPERSION STABILIZER; TONER COMPOSITIONS IN ELECTROPHOTOGRAPHIC AND DIRECT PRINTING SYSTEMS AND POWDER COATINGS TICONA GMBH (DE) 2002-04-02 US disclosed
EP-0943643-A1 Manufacturing methods, based on non aqueous dispersion techniques, to produce spherical polyester particles with narrow particle size distributions and tailorable mean particle sizes Ticona GmbH (DE) 1999-09-22 EP disclosed
EP-0943658-A1 Spherical, dyable polyester particles, process for their production and their use for high resolution toners Ticona GmbH (DE) 1999-09-22 EP disclosed
US-5302686-A Having low oligomer content; blow or injection molding MITSUBISHI KASEI CORPORATION (JP) 1994-04-12 US disclosed
US-5262513-A Terephthalic acid, dicarboxylic acid and ethylene glycol terpolymers MITSUBISHI KASEI CORPORATION (JP) 1993-11-16 US disclosed
JP-H04247064-A PRODUCTION OF 5-SULFOISOPHTHALIC ACID DERIVATIVE TAOKA CHEM CO LTD 1992-09-03 JP disclosed