⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12795845 | 1.00 | — | — | |
| SCHEMBL9575138 | 0.83 | — | — | |
| SCHEMBL5846703 | 0.73 | — | — | |
| SCHEMBL9223919 | 0.73 | — | — | |
| SCHEMBL13368968 | 0.72 | — | — | |
| SCHEMBL18950221 | 0.72 | — | — | |
| SCHEMBL15120429 | 0.72 | — | — | |
| SCHEMBL16926192 | 0.72 | — | — | |
| SCHEMBL21559804 | 0.72 | — | — | |
| SCHEMBL16846600 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 79 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12412749-B2 | Etching method and plasma processing system | TOKYO ELECTRON LIMITED (JP) | 2025-09-09 | — | — | US | claimed |
| US-20230307243-A1 | ETCHING METHOD AND PLASMA PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2023-09-28 | — | — | US | claimed |
| WO-2019165279-A1 | ORGANS-ON-CHIPS AS A PLATFORM FOR EPIGENETICS DISCOVERY | EMULATE, Inc. (US) | 2019-08-29 | — | — | WO | claimed |
| US-20100320428-A1 | GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS | HONEYWELL INTERNATIONAL INC. (US) | 2010-12-23 | — | — | US | claimed |
| US-20260136859-A1 | ETCHING METHOD AND ETCHING DEVICE | TOKYO ELECTRON LIMITED (JP) | 2026-05-14 | — | — | US | disclosed |
| US-20260107715-A1 | PLASMA PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2026-04-16 | — | — | US | disclosed |
| US-12532681-B2 | Etching method and plasma processing system | TOKYO ELECTRON LIMITED (JP) | 2026-01-20 | — | — | US | disclosed |
| US-12412749-B2 | Etching method and plasma processing system | TOKYO ELECTRON LIMITED (JP) | 2025-09-09 | — | — | US | disclosed |
| US-20250191889-A1 | PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2025-06-12 | — | — | US | disclosed |
| US-20250191927-A1 | ETCHING METHOD AND PLASMA PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2025-06-12 | — | — | US | disclosed |
| US-20250095991-A1 | ETCHING METHOD AND PLASMA PROCESSING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2025-03-20 | — | — | US | disclosed |
| WO-2025018161-A1 | ETCHING METHOD AND ETCHING DEVICE | 東京エレクトロン株式会社 | 2025-01-23 | — | — | WO | disclosed |
| US-7422860-B2 | Optoelectronic detection system | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2008-09-09 | — | — | US | disclosed |
| US-20080166705-A1 | Antibody diversity for detection of multiple and rare target particles or antigens; combining the crosslinked antigen with an emittor cell comprising an antibody that binds to the crosslinked antigen; measuring photon emission from the emittor cell | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2008-07-10 | — | — | US | disclosed |
| WO-2008078092-A1 | FERROCENYL BORONIC ACID BASED SENSOR FOR FLUORIDE AND CYANIDE | UNIVERSITY COLLEGE CARDIFF CONSULTANTS LTD. (GB) | 2008-07-03 | — | — | WO | disclosed |
| WO-2008048300-A2 | PATHOGEN DETECTION BIOSENSOR | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2008-04-24 | — | — | WO | disclosed |
| WO-2007046825-A9 | OPTOELECTRONIC DETECTION SYSTEM | MASSACHUSETTS INST TECHNOLOGY (US) | 2007-06-21 | — | — | WO | disclosed |
| US-20050171390-A1 | Wet oxidation process and system | USFILTER CORPORATION (US) | 2005-08-04 | — | — | US | disclosed |
| US-4840911-A | Use of sulfoxides for testing ionization detector system | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) | 1989-06-20 | — | — | US | disclosed |
| US-3932566-A | Phosphonate polymers | CELANESE CORPORATION (US) | 1976-01-13 | — | — | US | disclosed |