⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL435429 | 0.83 | — | — | |
| SCHEMBL12795845 | 0.83 | — | — | |
| SCHEMBL10016042 | 0.72 | — | — | |
| SCHEMBL18950221 | 0.72 | — | — | |
| SCHEMBL18994864 | 0.72 | — | — | |
| SCHEMBL16926192 | 0.72 | — | — | |
| SCHEMBL13368968 | 0.72 | — | — | |
| SCHEMBL15120429 | 0.72 | — | — | |
| SCHEMBL16846600 | 0.72 | — | — | |
| SCHEMBL21559804 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12412749-B2 | Etching method and plasma processing system | TOKYO ELECTRON LIMITED (JP) | 2025-09-09 | — | — | US | claimed |
| US-20230307243-A1 | ETCHING METHOD AND PLASMA PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2023-09-28 | — | — | US | claimed |
| US-12636258-B2 | Drug delivery composition | JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) | 2026-05-26 | — | — | US | disclosed |
| US-20260136859-A1 | ETCHING METHOD AND ETCHING DEVICE | TOKYO ELECTRON LIMITED (JP) | 2026-05-14 | — | — | US | disclosed |
| US-20260107715-A1 | PLASMA PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2026-04-16 | — | — | US | disclosed |
| US-12532681-B2 | Etching method and plasma processing system | TOKYO ELECTRON LIMITED (JP) | 2026-01-20 | — | — | US | disclosed |
| US-12412749-B2 | Etching method and plasma processing system | TOKYO ELECTRON LIMITED (JP) | 2025-09-09 | — | — | US | disclosed |
| US-20250191889-A1 | PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2025-06-12 | — | — | US | disclosed |
| US-20250191927-A1 | ETCHING METHOD AND PLASMA PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2025-06-12 | — | — | US | disclosed |
| US-20250095991-A1 | ETCHING METHOD AND PLASMA PROCESSING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2025-03-20 | — | — | US | disclosed |
| WO-2025018161-A1 | ETCHING METHOD AND ETCHING DEVICE | 東京エレクトロン株式会社 | 2025-01-23 | — | — | WO | disclosed |
| EP-2667276-B1 | Method of, and apparatus for, providing a gas mixture | AIR PROD & CHEM (US) | 2017-11-08 | — | — | EP | disclosed |
| EP-3239352-A1 | ELECTROMAGNETIC STEEL SHEET | Nippon Steel & Sumitomo Metal Corporation (JP) | 2017-11-01 | — | — | EP | disclosed |
| US-9734922-B2 | System and method for operating a modular nuclear fission deflagration wave reactor | TERRAPOWER, LLC (US) | 2017-08-15 | — | — | US | disclosed |
| US-9551050-B2 | Aluminum alloy with additions of scandium, zirconium and erbium | THE BOEING COMPANY (US) | 2017-01-24 | — | — | US | disclosed |
| WO-2014005668-A1 | METHOD FOR PRODUCING TRIS (PERFLUOROALKYL) PHOSPHINE OXIDES AND BIS (PERFLUOROALKYL) PHOSPHINIC ACIDS | MERCK PATENT GMBH (DE) | 2014-01-09 | — | — | WO | disclosed |
| WO-2011142412-A1 | NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY | 三菱化学株式会社 (JP) | 2011-11-17 | — | — | WO | disclosed |
| US-20070057522-A1 | Tool to pick up microparts | KELLER CHRISTPHER G | 2007-03-15 | — | — | US | disclosed |
| US-5180848-A | Synthesis of phosphinoacetic acids | PHILLIPS PETROLEUM COMPANY (US) | 1993-01-19 | — | — | US | disclosed |
| US-5157153-A | Reacting alkyl ethynyl ether or monohaloacetaldehyde acetal with alkali metal base, then with halodihydrocarbylphosphine; adding mineral acid, hydrolyzing | PHILLIPS PETROLEUM COMPANY (US) | 1992-10-20 | — | — | US | disclosed |