SCHEMBL435498

SCHEMBL435498

CCO[SnH]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ether SCHEMBL9248046 0.59 ALDH1A1 (0.47)
SCHEMBL27970741 0.59
Ether SCHEMBL6 0.59
SCHEMBL27065 0.59
Ether SCHEMBL21406 0.59 ALDH1A1 (0.47)
Ether SCHEMBL9248674 0.59 ALDH1A1 (0.47)
Ether SCHEMBL8160191 0.59 ALDH1A1 (0.47)
SCHEMBL1473 0.59
Ether SCHEMBL1312666 0.56 ALDH1A1 (0.44)
Ether SCHEMBL8391342 0.56

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0983777-B1 Process for the post-harvest treatment of fruits and vegetables with purification of phytosanitary products contaminated with primary aromatic amines XEDA INTERNATIONAL (FR) 2004-03-24 EP claimed
US-12421355-B2 Biodegradable block copolymer TORAY INDUSTRIES, INC. (JP) 2025-09-23 US disclosed
US-12115285-B2 Cylindrical member for implantation TORAY INDUSTRIES, INC. (JP) 2024-10-15 US disclosed
CN-116120345-A Phenanthroline derivative, organic electroluminescent device and display or lighting device 浙江华显光电科技有限公司 2023-05-16 CN disclosed
EP-3778716-B1 BIODEGRADABLE BLOCK COPOLYMER TORAY INDUSTRIES (JP) 2022-11-16 EP disclosed
US-20210322650-A1 CYLINDRICAL MEMBER FOR IMPLANTATION TORAY INDUSTRIES, INC. (JP) 2021-10-21 US disclosed
EP-3845202-A1 CYLINDRICAL MEMBER FOR IMPLANTATION Toray Industries, Inc. (JP) 2021-07-07 EP disclosed
EP-3778716-A1 BIODEGRADABLE BLOCK COPOLYMER Toray Industries, Inc. (JP) 2021-02-17 EP disclosed
US-20210002432-A1 BIODEGRADABLE BLOCK COPOLYMER TORAY INDUSTRIES, INC. (JP) 2021-01-07 US disclosed
WO-2020034181-A1 QUATERNARY TRIPHENYLPHOSPHONIUM SALT COMPOUND, PREPARATION METHOD THEREFOR, AND USES THEREOF 中国农业大学 2020-02-20 WO disclosed
EP-1371752-B1 Layer formation method, and substrate with a layer formed by the method KONICA CORP (JP) 2008-05-07 EP disclosed
WO-2007139379-A1 METHOD AND APPARATUS FOR DEPOSITION USING PULSED ATMOSPHERIC PRESSURE GLOW DISCHARGE FUJIFILM MANUFACTURING EUROPE B.V. (NL) 2007-12-06 WO disclosed
WO-2007091891-A1 SHORT PULSE ATMOSPHERIC PRESSURE GLOW DISCHARGE METHOD AND APPARATUS FUJIFILM MANUFACTURING EUROPE B.V. (NL) 2007-08-16 WO disclosed
US-7166335-B2 Layer formation method, and substrate with a layer formed by the method KONICA CORPORATION (JP) 2007-01-23 US disclosed
US-20060199014-A1 supplying discharge gas containing nitrogen into space formed between electrodes transferring energy of excited discharge gas to film forming gas, exposing substrate to film forming gas KONICA MINOLTA HOLDINGS, INC. (JP) 2006-09-07 US disclosed
EP-1645657-A1 METHOD FOR FORMING THIN FILM AND BASE HAVING THIN FILM FORMED BY SUCH METHOD KONICA MINOLTA HOLDINGS, INC. (JP) 2006-04-12 EP disclosed
US-20040213920-A1 Layer formation method, and substrate with a layer formed by the method KONICA CORPORATION (JP) 2004-10-28 US disclosed
US-6759100-B2 ATMOSPHERIC PRESSURE PLASMA DISCHARGE TREATMENT; CHEAP AND SAFE DISCHARGE GAS SUCH AS NITROGEN KONICA CORPORATION (JP) 2004-07-06 US disclosed
US-20030232136-A1 Layer formation method, and substrate with a layer formed by the method KONICA CORPORATION (JP) 2003-12-18 US disclosed
EP-1371752-A2 Layer formation method, and substrate with a layer formed by the method KONICA CORPORATION (JP) 2003-12-17 EP disclosed