SCHEMBL4355059

SCHEMBL4355059

OB(O)F.OB(O)F.OB(O)F.OB(O)F.[Cu]

nearest known ligand 0.38

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.38
TSHR P16473 1/20 0.38
TDP1 Q9NUW8 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1357775 0.94
SCHEMBL25487 0.93
SCHEMBL3629581 0.93 LMNA (0.43) LMNATSHRTDP1
SCHEMBL633724 0.93 LMNA (0.43) LMNATSHRTDP1
Ammonia Solution, Strong SCHEMBL2406408 0.86 LMNA (0.38) LMNATSHRTDP1
SCHEMBL7266668 0.86
SCHEMBL2485997 0.86 LMNA (0.38) LMNATSHRTDP1
Ammonia Solution, Strong SCHEMBL20819413 0.86 LMNA (0.38) LMNATSHRTDP1
Phosphine SCHEMBL20567497 0.86 LMNA (0.38) LMNATSHRTDP1
Fluoride SCHEMBL10544985 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090107851-A1 Electrolytic polishing method of substrate EBARA CORPORATION (JP) 2009-04-30 US claimed
US-20090107851-A1 Electrolytic polishing method of substrate EBARA CORPORATION (JP) 2009-04-30 US disclosed