⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4351177 | 0.83 | — | — | |
| SCHEMBL4359685 | 0.79 | — | — | |
| SCHEMBL4355411 | 0.78 | — | — | |
| SCHEMBL4361819 | 0.78 | — | — | |
| SCHEMBL4354818 | 0.74 | — | — | |
| SCHEMBL4359996 | 0.74 | ALDH1A1 (0.40) | — | |
| SCHEMBL4363133 | 0.73 | — | — | |
| SCHEMBL4360012 | 0.72 | ALDH1A1 (0.35) | — | |
| SCHEMBL24379507 | 0.71 | — | — | |
| SCHEMBL21501998 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090035702-A1 | PROCESS FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP | KYOWA HAKKO CHEMICAL CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20060177763-A1 | Method for producing compound having acid-labile group | KYOWA HAKKO CHEMICAL CO., LTD. (JP) | 2006-08-10 | — | — | US | disclosed |
| EP-1661918-A1 | METHOD FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP | Kyowa Hakko Chemical Co., Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |