Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EGFR | P00533 | 1/20 | 0.43 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.43 |
| ▸ | CNR2 | P34972 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | NR1H2 | P55055 | 4/20 | 0.39 |
| ▸ | NR1H3 | Q13133 | 4/20 | 0.39 |
| ▸ | MAPT | P10636 | 4/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | MITF | O75030 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25913652 | 0.91 | CNR2 (0.44) | EGFRERBB2CNR2ALDH1A1KDM4E | |
| SCHEMBL627242 | 0.90 | CYP2C19 (0.45) | EGFRERBB2CNR2ALDH1A1KDM4E | |
| SCHEMBL903672 | 0.89 | CYP2C19 (0.41) | EGFRERBB2CNR2ALDH1A1KDM4E | |
| SCHEMBL21065748 | 0.88 | CYP2C19 (0.44) | EGFRERBB2CNR2ALDH1A1KDM4E | |
| Lithium Ion SCHEMBL19732617 | 0.88 | CYP2C19 (0.44) | EGFRERBB2CNR2ALDH1A1KDM4E | |
| SCHEMBL33921 | 0.88 | CYP2C19 (0.47) | CNR2ALDH1A1KDM4ETDP1CYP2C19 | |
| SCHEMBL15682788 | 0.86 | EGFR (0.42) | EGFRERBB2CNR2ALDH1A1KDM4E | |
| SCHEMBL17660036 | 0.86 | EGFR (0.42) | EGFRERBB2CNR2ALDH1A1KDM4E | |
| SCHEMBL17660030 | 0.86 | EGFR (0.42) | EGFRERBB2CNR2ALDH1A1KDM4E | |
| SCHEMBL21242480 | 0.86 | CNR2 (0.48) | EGFRERBB2CNR2ALDH1A1CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4370611-A1 | COATING COMPOSITION | Jotun A/S (NO) | 2024-05-22 | — | — | EP | disclosed |
| WO-2023285527-A1 | COATING COMPOSITION | JOTUN A/S (NO) | 2023-01-19 | — | — | WO | disclosed |
| US-20220049039-A1 | RADICAL POLYMERIZABLE RESIN COMPOSITION AND STRUCTURE REPAIRING MATERIAL | SHOWA DENKO K.K. (JP) | 2022-02-17 | — | — | US | disclosed |
| US-20210283655-A1 | STRUCTURE REPAIRING METHOD | SHOWA DENKO K.K. (JP) | 2021-09-16 | — | — | US | disclosed |
| EP-3858805-A1 | STRUCTURE REPAIRING METHOD | Showa Denko K.K. (JP) | 2021-08-04 | — | — | EP | disclosed |
| EP-3858880-A1 | RADICAL POLYMERIZABLE RESIN COMPOSITION AND STRUCTURE REPAIRING MATERIAL | Showa Denko K.K. (JP) | 2021-08-04 | — | — | EP | disclosed |
| US-20210214471-A1 | RADICALLY POLYMERIZABLE PUTTY-LIKE RESIN COMPOSITION, SEALING AGENT AND CRACK REPAIRING METHOD | SHOWA DENKO K.K. (JP) | 2021-07-15 | — | — | US | disclosed |
| WO-2020066363-A1 | STRUCTURE REPAIRING METHOD | 昭和電工株式会社 | 2020-04-02 | — | — | WO | disclosed |
| WO-2020066364-A1 | RADICAL POLYMERIZABLE RESIN COMPOSITION AND STRUCTURE REPAIRING MATERIAL | 昭和電工株式会社 | 2020-04-02 | — | — | WO | disclosed |
| US-20180002562-A1 | LOW-TEMPERATURE-CURABLE CROSS-SECTION REPAIR MATERIAL, AND CROSS-SECTION REPAIRING METHOD USING THE SAME | SHOWA DENKO K.K. (JP) | 2018-01-04 | — | — | US | disclosed |
| EP-3260479-A1 | LOW-TEMPERATURE-CURABLE CROSS-SECTION REPAIR MATERIAL, AND CROSS-SECTION REPAIR METHOD USING SAME | Showa Denko K.K. (JP) | 2017-12-27 | — | — | EP | disclosed |
| EP-2028202-B1 | RADICAL POLYMERIZABLE RESIN COMPOSITION | SHOWA DENKO KK (JP) | 2012-10-31 | — | — | EP | disclosed |
| EP-2028202-A1 | RADICAL POLYMERIZABLE RESIN COMPOSITION | SHOWA HIGHPOLYMER CO., LTD. (JP) | 2009-02-25 | — | — | EP | disclosed |