Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC29A1 | Q99808 | 18/20 | 0.47 |
| ▸ | PRUNE1 | Q86TP1 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | PDE2A | O00408 | 1/20 | 0.38 |
| ▸ | RGS12 | O14924 | 1/20 | 0.38 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.38 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.38 |
| ▸ | ABCC4 | O15439 | 1/20 | 0.38 |
| ▸ | ABCC5 | O15440 | 1/20 | 0.38 |
| ▸ | PDE6D | O43924 | 1/20 | 0.38 |
| ▸ | PDE8A | O60658 | 1/20 | 0.38 |
| ▸ | GMNN | O75496 | 1/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
| ▸ | PDE5A | O76074 | 1/20 | 0.38 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.38 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3223591 | 0.98 | SLC29A1 (0.44) | SLC29A1PRUNE1KDM4EMEN1PDE2A | |
| SCHEMBL11986991 | 0.98 | SLC29A1 (0.48) | SLC29A1PRUNE1KDM4EMEN1PDE2A | |
| SCHEMBL6124092 | 0.98 | SLC29A1 (0.44) | SLC29A1PRUNE1KDM4EMEN1PDE2A | |
| SCHEMBL17857263 | 0.91 | SLC29A1 (0.54) | SLC29A1PRUNE1KDM4EMEN1PDE2A | |
| SCHEMBL2754985 | 0.89 | SLC29A1 (0.42) | SLC29A1PRUNE1KDM4EMEN1PDE2A | |
| SCHEMBL18174859 | 0.87 | SLC29A1 (0.43) | SLC29A1PRUNE1KDM4EMEN1PDE2A | |
| SCHEMBL12134868 | 0.85 | SLC29A1 (0.41) | SLC29A1PRUNE1 | |
| SCHEMBL20102188 | 0.84 | SLC29A1 (0.38) | SLC29A1PRUNE1KDM4EMEN1PDE2A | |
| SCHEMBL18288099 | 0.84 | SLC29A1 (0.40) | SLC29A1PRUNE1MEN1ALDH1A1GAA | |
| SCHEMBL12151272 | 0.84 | SLC29A1 (0.43) | SLC29A1PRUNE1MEN1ALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180087010-A1 | PRE-RINSING LIQUID, PRE-RINSING TREATMENT METHOD, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2018-03-29 | — | — | US | disclosed |
| US-20180052391-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, INSULATING FILM AND MULTILAYER WIRING BOARD | TORAY INDUSTRIES, INC. (JP) | 2018-02-22 | — | — | US | disclosed |
| US-20170351176-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |
| US-9777102-B2 | Modified novolak phenolic resin, making method, and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-03 | — | — | US | disclosed |
| US-9761741-B2 | Film-forming material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9760030-B2 | Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 2017-09-12 | — | — | US | disclosed |
| US-20170247334-A1 | IMIDAZOLE COMPOUND, METAL SURFACE TREATMENT LIQUID, METAL SURFACE TREATMENT METHOD, AND LAMINATE PRODUCTION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-08-31 | — | — | US | disclosed |
| US-9664827-B2 | Colored composition, method of producing color filter using the same, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2017-05-30 | — | — | US | disclosed |
| US-9632222-B2 | Method for manufacturing a color filter, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9633848-B2 | Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2017-04-25 | — | — | US | disclosed |
| US-8334338-B2 | Composition for forming resist lower layer film | JSR CORPORATION (JP) | 2012-12-18 | — | — | US | disclosed |
| US-20120292487-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120115084-A1 | CROSSLINKING AGENT, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING METHOD USING THE NEGATIVE RESIST COMPOSITION | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-05-10 | — | — | US | disclosed |
| US-20120064442-A1 | ELECTROPHOTOGRAPHIC PHOTORECEPTOR, METHOD FOR PRODUCING ELECTROPHOTOGRAPHIC PHOTORECEPTOR, IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE | FUJI XEROX CO., LTD. (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20120052449-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20110287234-A1 | NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2011-11-24 | — | — | US | disclosed |
| US-20110284855-A1 | RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME | TORAY INDUSTRIES, INC. (JP) | 2011-11-24 | — | — | US | disclosed |
| US-20110251323-A1 | COMPOSITION FOR FORMING RESIST LOWER LAYER FILM | JSR CORPORATION | 2011-10-13 | — | — | US | disclosed |
| US-20110171436-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND ELECTRONIC PARTS | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110086310-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCTION OF MICROLENS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-04-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120115084-A1 | CROSSLINKING AGENT, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING METHOD USING THE NEGATIVE RESIST COMPOSITION | SEM1, ELL, POLL | SLC29A1 3896/4885PRUNE1 546/4885KDM4E 568/4885 |
| US-20170247334-A1 | IMIDAZOLE COMPOUND, METAL SURFACE TREATMENT LIQUID, METAL SURFACE TREATMENT METHOD, AND LAMINATE PRODUCTION METHOD | FASN, SLC27A1, SLC27A2 | SLC29A1 1346/4885PRUNE1 4439/4885KDM4E 1083/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.