Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4374913 | 1.00 | CES2 (0.30) | CES2GBA1 | |
| SCHEMBL4376188 | 1.00 | CES2 (0.30) | CES2GBA1 | |
| SCHEMBL4371579 | 1.00 | CES2 (0.30) | CES2GBA1 | |
| SCHEMBL4365140 | 0.97 | — | — | |
| SCHEMBL11062260 | 0.92 | MEN1 (0.38) | CES2 | |
| SCHEMBL4365827 | 0.91 | — | — | |
| SCHEMBL4429558 | 0.90 | CES2 (0.43) | CES2GBA1 | |
| SCHEMBL4427588 | 0.90 | CES2 (0.43) | CES2GBA1 | |
| SCHEMBL4432502 | 0.90 | CES2 (0.43) | CES2GBA1 | |
| SCHEMBL4429063 | 0.90 | CES2 (0.43) | CES2GBA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090035696-A1 | PHOTORESIST COMPOSITION | KYOWA HAKKO CHEMICAL CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| EP-0101905-B1 | METHOD OF MODIFYING THE OZONE RESISTANCE OF RUBBER AND SUITABLE ENOL ETHERS | BAYER AG (DE) | 1987-06-10 | — | — | EP | disclosed |
| US-4481321-A | Process for increasing the ozone-resistance of a rubber with enol ethers | BAYER AKTIENGESELLSCHAFT (DE) | 1984-11-06 | — | — | US | disclosed |
| EP-0101905-A1 | Method of modifying the ozone resistance of rubber and suitable enol ethers | BAYER AG (DE) | 1984-03-07 | — | — | EP | disclosed |