Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.67 |
| ▸ | HPGD | P15428 | 1/20 | 0.67 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.56 |
| ▸ | TP53 | P04637 | 3/20 | 0.56 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.56 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.56 |
| ▸ | HCAR2 | Q8TDS4 | 4/20 | 0.50 |
| ▸ | THRB | P10828 | 3/20 | 0.50 |
| ▸ | ATM | Q13315 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | APP | P05067 | 1/20 | 0.37 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propylamine SCHEMBL3281793 | 0.94 | TSHR (0.64) | TSHRHPGDALDH1A1TP53HIF1A | |
| Methylamine SCHEMBL4367430 | 0.93 | TSHR (0.69) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL30074662 | 0.93 | TSHR (0.75) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL14982 | 0.93 | — | — | |
| Allylamine SCHEMBL28296730 | 0.92 | TSHR (0.62) | TSHRHPGDALDH1A1TP53HIF1A | |
| Methylamine SCHEMBL28257768 | 0.91 | TSHR (0.67) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL2546168 | 0.91 | — | — | |
| Ethylene SCHEMBL7197435 | 0.91 | TSHR (0.72) | TSHRHPGDALDH1A1TP53HIF1A | |
| Hydrochloric Acid SCHEMBL15846411 | 0.91 | — | — | |
| Ammonia Solution, Strong SCHEMBL22686891 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8524111-B2 | CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-09-03 | — | — | US | claimed |
| CN-120019125-A | Adhesive film, optical member including the same, and optical display device including the same | 三星SDI株式会社 | 2025-05-16 | — | — | CN | disclosed |
| US-8524111-B2 | CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-09-03 | — | — | US | disclosed |
| US-20090047786-A1 | CMP Abrasive Slurry for Polishing Insulation Film, Polishing Method, and Semiconductor Electronic Part Polished by the Polishing Method | RESONAC CORPORATION (JP) | 2009-02-19 | — | — | US | disclosed |