SCHEMBL4373203

SCHEMBL4373203

FC1(F)C(F)(F)C12CC1C=CC2C1

nearest known ligand 0.35

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.35
CYP2C19 P33261 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL200374 0.75
SCHEMBL10020723 0.73 CYP2D6 (0.33) CYP2D6CYP2C19
SCHEMBL13525855 0.71
SCHEMBL13525839 0.67 CYP2D6 (0.47) CYP2D6CYP2C19
SCHEMBL9063860 0.67
SCHEMBL2469986 0.66 CYP2D6 (0.35) CYP2D6CYP2C19
SCHEMBL14511665 0.66 CYP2D6 (0.32) CYP2D6CYP2C19
SCHEMBL201636 0.65 CYP2D6 (0.34) CYP2D6CYP2C19
SCHEMBL9804957 0.65
SCHEMBL223593 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150185616-A1 RESISTS FOR LITHOGRAPHY PIXELLIGENT TECHNOLOGIES, LLC 2015-07-02 US disclosed
US-20130136897-A1 RESISTS FOR LITHOGRAPHY PIXELLIGENT TECHNOLOGIES, LLC (US) 2013-05-30 US disclosed
US-8383316-B2 Multi-step; reversible; provide exposure quadratically dependant on intensity of light; semiconductors PIXELLIGENT TECHNOLOGIES, LLC (US) 2013-02-26 US disclosed
EP-2047332-A2 RESISTS FOR PHOTOLITHOGRAPHY Pixelligent Technologies LLC, (US) 2009-04-15 EP disclosed
US-20080176166-A1 RESISTS FOR LITHOGRAPHY PIXELLIGENT TECHNOLOGIES, LLC 2008-07-24 US disclosed
WO-2008008275-A2 RESISTS FOR PHOTOLITHOGRAPHY PIXELLIGENT TECHNOLOGIES LLC (US) 2008-01-17 WO disclosed