SCHEMBL4381790

SCHEMBL4381790

O=C(CS)NCCCn1c2ccccc2c2ccccc21

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC6 Q9UBN7 11/20 0.56
HDAC1 Q13547 8/20 0.56
FABP4 P15090 3/20 0.54
FABP5 Q01469 3/20 0.54
CNR2 P34972 1/20 0.49
FNTA P49354 2/20 0.49
FNTB P49356 2/20 0.49
FABP3 P05413 1/20 0.49
HDAC8 Q9BY41 5/20 0.48
HDAC3 O15379 4/20 0.48
HDAC4 P56524 4/20 0.48
HDAC7 Q8WUI4 4/20 0.48
HDAC2 Q92769 4/20 0.48
HDAC10 Q969S8 4/20 0.48
HDAC11 Q96DB2 4/20 0.48
HDAC9 Q9UKV0 4/20 0.48
HDAC5 Q9UQL6 4/20 0.48
KDM4E B2RXH2 2/20 0.47
CYP1A2 P05177 1/20 0.45
CYP3A4 P08684 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19071912 0.82 CNR2 (0.41) HDAC6HDAC1FABP4FABP5CNR2
SCHEMBL12938907 0.78 HDAC6 (0.67) HDAC6HDAC1HDAC10KDM4E
SCHEMBL10498956 0.78 FABP4 (0.53) HDAC6HDAC1FABP4FABP5CNR2
SCHEMBL1003493 0.72 HDAC6 (1.00) HDAC6HDAC1FABP4FABP5FABP3
SCHEMBL4552481 0.72 FABP4 (0.68) HDAC6HDAC1FABP4FABP5FABP3
SCHEMBL4552166 0.72 FABP4 (0.64) HDAC6HDAC1FABP4FABP5FABP3
SCHEMBL11712442 0.72 FABP4 (0.51) HDAC6HDAC1FABP4FABP5
SCHEMBL4151253 0.71 FABP4 (0.58) HDAC6HDAC1FABP4FABP5FNTA
SCHEMBL1004139 0.71 HDAC6 (1.00) HDAC6HDAC1FABP4FABP5HDAC8
SCHEMBL1003614 0.71 HDAC6 (1.00) HDAC6HDAC1FABP4FABP5HDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1072948-B1 Thermally processed image recording material FUJIFILM CORP (JP) 2017-07-05 EP disclosed
EP-1041433-B1 Heat-developable photosensitive material and method for forming image using the same FUJIFILM CORP (JP) 2009-11-25 EP disclosed
EP-0990946-B1 Heat-developable photosensitive material FUJIFILM CORP (JP) 2009-09-09 EP disclosed
US-7488572-B2 Image formation method FUJIFILM CORPORATION (JP) 2009-02-10 US disclosed
US-7488572-B2 Image formation method FUJIFILM CORPORATION (JP) 2009-02-10 US disclosed
EP-1041434-B1 Heat-developable photosensitive material FUJI PHOTO FILM CO LTD (JP) 2005-11-02 EP disclosed
US-6924089-B2 Heat-developable photosensitive material and image forming method FUJI PHOTO FILM CO., LTD. (JP) 2005-08-02 US disclosed
EP-1134611-B1 Photothermographic material and method for forming images FUJI PHOTO FILM CO LTD (JP) 2005-07-20 EP disclosed
EP-1041435-B1 Heat-developable photographic material FUJI PHOTO FILM CO LTD (JP) 2004-11-24 EP disclosed
US-20030235791-A1 Heat-developable photosensitive material and image forming method FUJI PHOTO FILM CO., LTD. 2003-12-25 US disclosed
US-20020098449-A1 Photothermographic material and method for forming images FUJIFILM CORPORATION (JP) 2002-07-25 US disclosed
US-6395466-B1 MIXTURE OF ORGANIC SILVER SALT, REDUCING AGENTS, PHOTOSENSITIVE SILVER HALIDE GRAINS AND BINDER FUJI PHOTO FILM CO., LTD. (JP) 2002-05-28 US disclosed
US-6376166-B1 PHOTOSENSITIVE SILVER HALIDE, REDUCABLE SILVER SALT AND PHENOL COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 2002-04-23 US disclosed
US-6350569-B1 POLYHALOGENATED ORGANIC COMPOUND, REDUCIBLE SILVER SALT, BINDER, AND REDUCING AGENT; STORAGE STABILITY, ANTIFOGGING AGENTS FUJI PHOTO FILM CO., LTD. (JP) 2002-02-26 US disclosed
US-6344313-B1 AFFORDS AN IMAGE WITH LOW FOG, LITTLE INCREASE OF FOG AND LITTLE FLUCTUATION OF SENSITIVITY DURING STORAGE BEFORE LIGHT EXPOSURE AND AN IMAGE OF HIGH DMAX (MAXIMUM DENSITY) SUITABLE FOR USE IN PHOTOMECHANICAL PROCESS FUJI PHOTO FILM CO., LTD. (JP) 2002-02-05 US disclosed
US-6329127-B1 HALOGEN-RELEASING PRECURSOR HAVING AT LEAST ONE DISSOCIATIVE OR HYDROPHILIC SUBSTITUENT AND A SECOND HYDROPHOBIC HALOGEN-RELEASING PRECURSOR; FUJI PHOTO FILM CO., LTD. (JP) 2001-12-11 US disclosed
EP-1134611-A2 Photothermographic material and method for forming images FUJI PHOTO FILM CO., LTD. (JP) 2001-09-19 EP disclosed
EP-1041433-A1 Heat-developable photosensitive material and method for forming image using the same FUJI PHOTO FILM CO., LTD. (JP) 2000-10-04 EP disclosed
EP-1041434-A1 Heat-developable photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 2000-10-04 EP disclosed
EP-1041435-A1 Heat-developable photographic material FUJI PHOTO FILM CO., LTD. (JP) 2000-10-04 EP disclosed