SCHEMBL4382082

SCHEMBL4382082

CC(C)(CO)CO.OC/C=C/CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4382084 1.00
SCHEMBL19621 0.82
SCHEMBL229715 0.82 ALDH1A1 (0.35)
SCHEMBL4635866 0.80
SCHEMBL4635863 0.80
SCHEMBL9650455 0.78
SCHEMBL2277021 0.78
Bromide SCHEMBL8990184 0.78 ALDH1A1 (0.33)
SCHEMBL7650639 0.78 ALDH1A1 (0.33)
Bromide SCHEMBL8990185 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7531288-B2 Negative-working excellent in preservation stability and exhibits high sensitivity and good printing durability; hydrophilic support; and a photosensitive layer containing a polymerization initiator, a chain transfer agent, a compound having an ethylenically unsaturated double bond and a polymer binder FUJIFILM CORPORATION (JP) 2009-05-12 US disclosed
US-20060199101-A1 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2006-09-07 US disclosed
US-20060068328-A1 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. 2006-03-30 US disclosed