SCHEMBL438578

SCHEMBL438578

O=C(CCCCCO)OO

nearest known ligand 0.52

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 1/20 0.52
FFAR1 O14842 1/20 0.52
FFAR4 Q5NUL3 1/20 0.52
KDM4E B2RXH2 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
GAA P10253 1/20 0.41
FNTA P49354 1/20 0.40
FNTB P49356 1/20 0.40
DGKA P23743 1/20 0.38
MAPT P10636 1/20 0.38
MAPK1 P28482 1/20 0.38
CAMK2A Q9UQM7 1/20 0.38
TSHR P16473 2/20 0.36
LMNA P02545 4/20 0.35
NAAA Q02083 2/20 0.35
NFKB1 P19838 1/20 0.35
PMP22 Q01453 1/20 0.35
PAM P19021 2/20 0.34
ALDH1A1 P00352 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28023927 1.00 GPR84 (0.52) GPR84FFAR1FFAR4KDM4ESMN1; SMN2
SCHEMBL11390490 1.00 GPR84 (0.52) GPR84FFAR1FFAR4KDM4ESMN1; SMN2
SCHEMBL27611857 1.00 GPR84 (0.52) GPR84FFAR1FFAR4KDM4ESMN1; SMN2
SCHEMBL27593721 1.00 GPR84 (0.52) GPR84FFAR1FFAR4KDM4ESMN1; SMN2
SCHEMBL2229993 1.00 GPR84 (0.52) GPR84FFAR1FFAR4KDM4ESMN1; SMN2
SCHEMBL3404395 1.00 GPR84 (0.52) GPR84FFAR1FFAR4KDM4ESMN1; SMN2
SCHEMBL27512451 1.00 GPR84 (0.52) GPR84FFAR1FFAR4KDM4ESMN1; SMN2
SCHEMBL11815064 1.00 GPR84 (0.52) GPR84FFAR1FFAR4KDM4ESMN1; SMN2
SCHEMBL11048307 0.97 GPR84 (0.50) GPR84FFAR1FFAR4KDM4ESMN1; SMN2
SCHEMBL28017999 0.97 GPR84 (0.50) GPR84FFAR1FFAR4KDM4ESMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230029768-A1 PROCESS FOR PRODUCING CYCLOHEXANOL AND CYCLOHEXANONE BASF SE (DE) 2023-02-02 US claimed
EP-4077252-A1 PROCESS FOR PRODUCING CYCLOHEXANOL AND CYCLOHEXANONE BASF SE (DE) 2022-10-26 EP claimed
CN-114845983-A Process for preparing cyclohexanol and cyclohexanone 巴斯夫欧洲公司 2022-08-02 CN claimed
WO-2021122955-A1 PROCESS FOR PRODUCING CYCLOHEXANOL AND CYCLOHEXANONE PERFORMANCE POLYAMIDES, SAS (FR) 2021-06-24 WO claimed
US-20070093402-A1 Bleaching agent particles encapsulated in a water soluble material HENKEL AG & CO. KGAA (DE) 2007-04-26 US claimed
JP-55120655-A None JP disclosed
EP-3432713-B1 NON-ALPHA SUBSTITUTED PEROXY ACIDS AND USES THEREOF STEPAN CO (US) 2023-06-14 EP disclosed
US-20230029768-A1 PROCESS FOR PRODUCING CYCLOHEXANOL AND CYCLOHEXANONE BASF SE (DE) 2023-02-02 US disclosed
EP-4077252-A1 PROCESS FOR PRODUCING CYCLOHEXANOL AND CYCLOHEXANONE BASF SE (DE) 2022-10-26 EP disclosed
CN-114845983-A Process for preparing cyclohexanol and cyclohexanone 巴斯夫欧洲公司 2022-08-02 CN disclosed
WO-2021122955-A1 PROCESS FOR PRODUCING CYCLOHEXANOL AND CYCLOHEXANONE PERFORMANCE POLYAMIDES, SAS (FR) 2021-06-24 WO disclosed
EP-3141601-B1 DOUBLE-CARBONYL REDUCTASE MUTANT AND APPLICATION OF SAME ASYMCHEM LAB TIANJIN CO LTD (CN) 2019-06-12 EP disclosed
EP-1192130-A1 PEROXY-CARBOXYLIC ACID AND AQUEOUS COMPOSITIONS THEREOF SOLVAY (Société Anonyme) (BE) 2002-04-03 EP disclosed
WO-2000076963-A1 NEW PEROXY-CARBOXYLIC ACID AND AQUEOUS COMPOSITIONS THEREOF Solvay (Société Anonyme) (BE) 2000-12-21 WO disclosed
WO-2000076963-A1 NEW PEROXY-CARBOXYLIC ACID AND AQUEOUS COMPOSITIONS THEREOF Solvay (Société Anonyme) (BE) 2000-12-21 WO disclosed
EP-1061071-A1 6-Hydroxypercaproic acid and aqueous compositions thereof SOLVAY (Société Anonyme) (BE) 2000-12-20 EP disclosed
EP-1061071-A1 6-Hydroxypercaproic acid and aqueous compositions thereof SOLVAY (Société Anonyme) (BE) 2000-12-20 EP disclosed
EP-1061071-A1 6-Hydroxypercaproic acid and aqueous compositions thereof SOLVAY (Société Anonyme) (BE) 2000-12-20 EP disclosed
US-4672095-A EMULSION AND GRAFT POLYMERIZING VINYL CHLORIDE AND A VINYL CHLORIDE-SOLUBLE THERMOPLASTIC POLYURETHANE DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-06-09 US disclosed
JP-S55120655-A RESIN COMPOSITION DAINIPPON INK & CHEM INC 1980-09-17 JP disclosed