SCHEMBL4389515

SCHEMBL4389515

C=C1CCC(=O)NC1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13570172 0.82 CRBN (0.48)
SCHEMBL251099 0.74
SCHEMBL21119115 0.72 KDM4E (0.38)
Succinimide SCHEMBL22806340 0.72
Succinimide SCHEMBL28744286 0.72 CRBN (0.85)
Succinimide SCHEMBL7263756 0.72
Succinimide SCHEMBL8361206 0.71 CRBN (1.00)
Succinimide SCHEMBL1466558 0.71
Succinimide SCHEMBL1326078 0.71 CRBN (1.00)
Succinimide SCHEMBL774 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025096856-A1 COVALENT CEREBLON LIGANDS C4 THERAPEUTICS, INC. (US) 2025-05-08 WO disclosed
CN-119751456-A Spiro compounds C4医药公司 2025-04-04 CN disclosed
US-20250101025-A1 NOVEL PLK1 DEGRADATION INDUCING COMPOUND UPPTHERA, INC. (KR) 2025-03-27 US disclosed
CN-112312904-B Spiro compounds C4医药公司 2025-01-07 CN disclosed
EP-4384521-A1 NOVEL PLK1 DEGRADATION INDUCING COMPOUND Uppthera, Inc. (KR) 2024-06-19 EP disclosed
US-20230416251-A1 SPIROCYCLIC COMPOUNDS C4 THERAPEUTICS, INC. (US) 2023-12-28 US disclosed
US-11584748-B2 Spirocyclic compounds C4 THERAPEUTICS, INC. (US) 2023-02-21 US disclosed
WO-2023017446-A1 NOVEL PLK1 DEGRADATION INDUCING COMPOUND UPPTHERA, INC. (KR) 2023-02-16 WO disclosed
WO-2023018237-A1 NOVEL PLK1 DEGRADATION INDUCING COMPOUND UPPTHERA, INC. (KR) 2023-02-16 WO disclosed
US-20210072642-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND RESIN FUJIFILM CORPORATION (JP) 2021-03-11 US disclosed
US-10351512-B2 Method of producing organic compound FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-07-16 US disclosed
US-20180244604-A1 METHOD OF PRODUCING ORGANIC COMPOUND FUJIFILM FINECHEMICALS CO., LTD. (JP) 2018-08-30 US disclosed
EP-3357898-A1 METHOD FOR PRODUCING ORGANIC COMPOUND Fujifilm Finechemicals Co., Ltd. (JP) 2018-08-08 EP disclosed
EP-1252144-B1 SUBSTITUTED GLUTARIMIDES AND USE THEREOF IL-12 PRODUCTION INHIBITORS GRUENENTHAL GMBH (DE) 2009-12-09 EP disclosed
US-20040048859-A1 Substituted glutarimides and their use as inhibitors of IL-12 production GRUENENTHAL GMBH (DE) 2004-03-11 US disclosed
US-6656937-B2 Immunology moderators; interleukin antagonist; anticancer agents GRUENENTHAL, GMBH (DE) 2003-12-02 US disclosed
US-20030064987-A1 Substituted glutarimides and their use as inhibitors of IL-12 production GRUENENTHAL GMBH 2003-04-03 US disclosed
EP-1252144-A1 SUBSTITUTED GLUTARIMIDES AND USE THEREOF IL-12 PRODUCTION INHIBITORS Grünenthal GmbH (DE) 2002-10-30 EP disclosed
WO-2001053261-A1 SUBSTITUTED GLUTARIMIDES AND USE THEREOF IL-12 PRODUCTION INHIBITORS Grünenthal GmbH (DE) 2001-07-26 WO disclosed
US-4015007-A Heterocyclic spiro compounds CIBA-GEIGY CORPORATION (US) 1977-03-29 US disclosed