SCHEMBL439013

SCHEMBL439013

Cc1cc(C)c(N)cc1N

nearest known ligand 0.80

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 5/20 0.80
TSHR P16473 4/20 0.80
MAPK1 P28482 1/20 0.80
ALDH1A1 P00352 8/20 0.60
HSD17B10 Q99714 2/20 0.60
CYP1A2 P05177 1/20 0.60
ALOX15 P16050 1/20 0.60
CASP7 P55210 1/20 0.60
HIF1A Q16665 1/20 0.60
TDP1 Q9NUW8 5/20 0.50
CASP1 P29466 1/20 0.50
PTK2 Q05397 1/20 0.50
TERT O14746 1/20 0.50
UHRF1 Q96T88 1/20 0.46
ATAD2 Q6PL18 1/20 0.44
CD44 P16070 1/20 0.43
TP53 P04637 1/20 0.42
MAPT P10636 3/20 0.41
KDM4E B2RXH2 2/20 0.41
MEN1 O00255 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL31703327 0.96 CYP3A4 (0.75) CYP3A4TSHRMAPK1ALDH1A1HSD17B10
SCHEMBL2386087 0.89 CYP3A4 (0.75) CYP3A4TSHRMAPK1ALDH1A1HSD17B10
SCHEMBL29452873 0.89 CYP3A4 (0.75) CYP3A4TSHRMAPK1ALDH1A1HSD17B10
SCHEMBL113803 0.89 CYP3A4 (1.00) CYP3A4TSHRMAPK1ALDH1A1HSD17B10
SCHEMBL33943 0.88 CYP3A4 (0.86) CYP3A4TSHRMAPK1ALDH1A1HSD17B10
Hydrochloric Acid SCHEMBL8640325 0.85 CYP3A4 (0.80) CYP3A4TSHRMAPK1ALDH1A1HSD17B10
Hydrochloric Acid SCHEMBL8640327 0.85 CYP3A4 (0.80) CYP3A4TSHRMAPK1ALDH1A1HSD17B10
SCHEMBL1199708 0.81 CYP3A4 (0.63) CYP3A4TSHRMAPK1ALDH1A1HSD17B10
SCHEMBL8121628 0.81 CYP3A4 (0.55) CYP3A4TSHRMAPK1ALDH1A1HSD17B10
SCHEMBL31387618 0.81 CYP3A4 (0.63) CYP3A4TSHRMAPK1ALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 430 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122011311-A Preparation method of metal nanocluster confined covalent organic framework composite material 西北工业大学 2026-05-12 CN claimed
CN-119771181-A Preparation method and process of oxidation-resistant reverse osmosis membrane 上海陕煤高新技术研究院有限公司 2025-04-08 CN claimed
CN-119019684-A Thermally-induced cross-linked phenolphthalein-based polybenzoxazole gas separation membrane material and preparation method thereof 中国石油化工股份有限公司 2024-11-26 CN claimed
CN-113967415-B Chlorine-resistant reverse osmosis membrane and preparation method thereof 湖南澳维膜科技有限公司 2023-11-28 CN claimed
CN-116217612-A Preparation method of carboxyl modified cyclosiloxane, low-dielectric porous polyamide liquid crystal material and preparation method thereof 江苏久耀新材料科技有限公司 2023-06-06 CN claimed
CN-115894998-A High-thermal-conductivity polyimide film and preparation method thereof 江西有泽新材料科技有限公司 2023-04-04 CN claimed
CN-114854087-B Polyimide composite material with double heat-conducting networks and preparation method thereof 吉林大学 2023-03-31 CN claimed
EP-4087892-A1 METHODS FOR PREPARING MIXED POLYAMIDES, POLYIMIDES AND POLYAMIDEIMLDES VIA HYDROTHERMAL POLYMERIZATION ExxonMobil Technology and Engineering Company (US) 2022-11-16 EP claimed
CN-114929782-A Method for producing mixed polyamides, polyimides and polyamideimides by hydrothermal polymerization 埃克森美孚技术与工程公司 2022-08-19 CN claimed
CN-114854087-A Polyimide composite material with double heat-conducting networks and preparation method thereof 吉林大学 2022-08-05 CN claimed
CN-113290894-A Preparation device and preparation method of integrated polyimide heat-conducting grid film/heat-conducting silica gel composite material with soft surface 哈工大机器人集团(无锡)科创基地研究院 2021-08-24 CN claimed
WO-2021141807-A1 METHODS FOR PREPARING MIXED POLYAMIDES, POLYIMIDES AND POLYAMIDEIMlDES VIA HYDROTHERMAL POLYMERIZATION EXXONMOBIL RESEARCH AND ENGINEERING COMPANY (US) 2021-07-15 WO claimed
CN-110776657-A High-thermal-conductivity polyimide film and preparation method thereof 株洲时代新材料科技股份有限公司 2020-02-11 CN claimed
US-6559245-B2 Suitable as electrically insulating protective layers for delicate, fragile conductive traces of the type produced by etching copper layers to form printed circuits 3M INNOVATIVE PROPERTIES COMPANY 2003-05-06 US claimed
EP-1272901-A1 PHOTOIMAGEABLE, AQUEOUS ACID SOLUBLE POLYIMIDE POLYMERS 3M Innovative Properties Company (US) 2003-01-08 EP claimed
US-20020086236-A1 Photoimageable, aqueous acid soluble polyimide polymers 3M INNOVATIVE PROPERTIES COMPANY 2002-07-04 US claimed
US-6379865-B1 PROTECTIVE COATINGS DEPOSITED BY ELECTROPHORESIS; HIGH ELECTRICAL RESISTANCE; 3M INNOVATIVE PROPERTIES COMPANY 2002-04-30 US claimed
WO-2001077753-A1 PHOTOIMAGEABLE, AQUEOUS ACID SOLUBLE POLYIMIDE POLYMERS 3M INNOVATIVE PROPERTIES COMPANY (US) 2001-10-18 WO claimed
US-4760185-A Process for the ortho-alkylation of optionally alkyl-substituted m-phenylenediamines BAYER AKTIENGESELLSCHAFT (DE) 1988-07-26 US claimed
US-4107151-A FROM POLYISOCYANATE, CHAIN POLYOL, AROMATIC DIAMINE, POLYOL OR AMINO ALCOHOL WITH URETHANE BOND IHARA CHEMICAL COMPANY CO., LTD. (JP) 1978-08-15 US claimed