SCHEMBL4392271

SCHEMBL4392271

[Cu].[Ni].[Pd]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29827703 1.00
SCHEMBL6244051 0.87
SCHEMBL4085515 0.87
SCHEMBL28751737 0.87
SCHEMBL6765313 0.87
SCHEMBL2802407 0.87
SCHEMBL7917424 0.87
SCHEMBL1169745 0.87
SCHEMBL22444984 0.87
SCHEMBL28690431 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 126 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116446000-B Preparation method of palladium-copper-nickel catalytic material for hydrogen production by formic acid, component and system for hydrogen production by formic acid with photo-thermal interface 中南大学 2024-07-19 CN claimed
CN-113539998-B Silicon-based three-dimensional integrated transceiver front end 南京国博电子股份有限公司 2024-06-04 CN claimed
CN-117156939-B Ceramic integrated circuit with solder resist function and preparation method thereof 四川科尔威光电科技有限公司 2024-02-09 CN claimed
CN-117156939-A Ceramic integrated circuit with solder resist function and preparation method thereof 四川科尔威光电科技有限公司 2023-12-01 CN claimed
CN-116446000-A Preparation method of palladium-copper-nickel catalytic material for hydrogen production by formic acid, component and system for hydrogen production by formic acid with photo-thermal interface 中南大学 2023-07-18 CN claimed
CN-113539998-A Silicon-based three-dimensional integrated transceiving front end 南京国博电子股份有限公司 2021-10-22 CN claimed
US-10396021-B2 Fabrication method of layer structure for mounting semiconductor device SILICONWARE PRECISION INDUSTRIES CO., LTD. (TW) 2019-08-27 US claimed
US-9972564-B2 Layer structure for mounting semiconductor device and fabrication method thereof SILICONWARE PRECISION INDUSTRIES CO., LTD. (TW) 2018-05-15 US claimed
US-20150206814-A1 LAYER STRUCTURE FOR MOUNTING SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF SILICONWARE PRECISION INDUSTRIES CO., LTD. (TW) 2015-07-23 US claimed
CN-103121904-B Utilization method for hydrocarbon fuel gas rich in alkyne CHINA PETROLEUM & CHEMICAL 2015-06-10 CN claimed
CN-103121905-B Recovery method of hydrocarbon fuel gas rich in alkyne CHINA PETROLEUM & CHEMICAL 2015-06-10 CN claimed
CN-103121905-A Recovery method of hydrocarbon fuel gas rich in alkyne CHINA PETROLEUM & CHEMICAL 2013-05-29 CN claimed
CN-103121904-A Utilization method for hydrocarbon fuel gas rich in alkyne CHINA PETROLEUM & CHEMICAL 2013-05-29 CN claimed
US-7087441-B2 Method of making a circuitized substrate having a plurality of solder connection sites thereon ENDICOTT INTERCONNECT TECHNOLOGIES, INC. (US) 2006-08-08 US claimed
US-20060099727-A1 Method of making a circuitized substrate having a plurality of solder connection sites thereon ENDICOTT INTERCONNECT TECHNOLOGIES, INC. (US) 2006-05-11 US claimed
US-20260150451-A1 WIRING BOARD, FUNCTIONAL BACKPLANE, BACKLIGHT MODULE, DISPLAY PANEL AND DISPLAY APPARATUS BOE TECHNOLOGY GROUP CO., LTD. (CN) 2026-05-28 US disclosed
US-20260136636-A1 SILICON CAPACITOR SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME DB HITEK CO LTD (KR) 2026-05-14 US disclosed
US-5703264-A REACTING ALIPHATIC ALCOHOL WITH AMMONIA IN PRESENCE OF CATALYST COMPRISING COPPER, TRANSITION METAL ELEMENT IN FOURTH PERIOD OTHER THAN CHROMIUM, PLATINUM GROUP ELEMENT UNDER SPECIFIED CONDITIONS KAO CORPORATION (JP) 1997-12-30 US disclosed
CN-1145898-A Process for producing aliphatic nitrile KAO CORP (JP) 1997-03-26 CN disclosed
EP-0312253-A2 Process for preparing n-substituted amine Kao Corporation (JP) 1989-04-19 EP disclosed