⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17058729 | 0.92 | HSD17B10 (0.39) | — | |
| SCHEMBL78235 | 0.84 | — | — | |
| SCHEMBL578959 | 0.84 | — | — | |
| SCHEMBL4394106 | 0.83 | — | — | |
| SCHEMBL4393752 | 0.82 | — | — | |
| Propane SCHEMBL10740306 | 0.82 | ALDH1A1 (0.35) | — | |
| SCHEMBL28775957 | 0.81 | — | — | |
| SCHEMBL28322082 | 0.81 | — | — | |
| SCHEMBL8812216 | 0.81 | HTT (0.54) | — | |
| SCHEMBL4348858 | 0.81 | HSD17B10 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114423742-B | Benzotriazole-based compound, light absorber and resin composition | 三井化学株式会社 | 2024-05-28 | — | — | CN | disclosed |
| CN-117466830-A | Benzotriazole-based compound, light absorber and resin composition | 三井化学株式会社 | 2024-01-30 | — | — | CN | disclosed |
| WO-2024005030-A1 | DIPHENYLETHENE-BASED COMPOUND, LIGHT ABSORBER, RESIN COMPOSITION, AND USE THEREOF | 山本化成株式会社 | 2024-01-04 | — | — | WO | disclosed |
| CN-110121499-B | (aza) indole-, benzothiophene-and benzofuran-3-sulfonamides | 优时比制药有限公司 | 2022-12-20 | — | — | CN | disclosed |
| CN-114423742-A | Benzotriazole compound, light absorber, and resin composition | 三井化学株式会社 | 2022-04-29 | — | — | CN | disclosed |
| WO-2021054459-A1 | BENZOTRIAZOLE COMPOUND, LIGHT ABSORBER, AND RESIN COMPOSITION | 三井化学株式会社 | 2021-03-25 | — | — | WO | disclosed |
| EP-2780313-A1 | METHOD FOR RECOVERING DI-TRIMETHYLOLPROPANE BY DISTILLATION | OXEA GmbH (DE) | 2014-09-24 | — | — | EP | disclosed |
| WO-2013072007-A1 | METHOD FOR RECOVERING DI-TRIMETHYLOLPROPANE BY DISTILLATION | OXEA GMBH (DE) | 2013-05-23 | — | — | WO | disclosed |
| US-20090306376-A1 | OPTICAL RECORDING MEDIUM AND COMPOUND USED FOR THE SAME | MITSUI CHEMICALS, INC. (JP) | 2009-12-10 | — | — | US | disclosed |
| US-7405030-B2 | Imide compound and optical recording media made by using the same | MITSUI CHEMICALS, INC. (JP) | 2008-07-29 | — | — | US | disclosed |
| US-20060088786-A1 | Rewritable optical information recording medium, recording and reproducing methods, as well as recording and reproducing apparatus | MITSUI CHEMICALS, INC. (JP) | 2006-04-27 | — | — | US | disclosed |
| US-20050208425-A1 | Imide compound and optical recording media made by using the same | YAMAMOTO CHEMICALS, INC. (JP) | 2005-09-22 | — | — | US | disclosed |
| EP-1180765-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS INC (JP) | 2005-04-06 | — | — | EP | disclosed |
| EP-1484191-A1 | REWRITABLE OPTICAL INFORMATION RECORDING MEDIUM AND RECORDING/REPRODUCING METHOD, RECORDING/REPRODUCING DEVICE | Sony Corporation (JP) | 2004-12-08 | — | — | EP | disclosed |
| EP-1445115-A1 | IMIDE COMPOUNDS AND OPTICAL RECORDING MEDIA MADE BY USING THE SAME | Mitsui Chemicals, Inc. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-6627288-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS, INC. (JP) | 2003-09-30 | — | — | US | disclosed |
| US-20030091931-A1 | Benzbisazole compound and optical recording medium containing the compound | MITSUI CHEMICALS, INC. (JP) | 2003-05-15 | — | — | US | disclosed |
| EP-1245571-A1 | BENZBISAZOLE COMPOUND AND OPTICAL RECORDING MEDIUM CONTAINING THE COMPOUND | Mitsui Chemicals, Inc. (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1180765-A1 | Optical recording medium and porphycene compound | Mitsui Chemicals, Inc. (JP) | 2002-02-20 | — | — | EP | disclosed |
| US-6106999-A | SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS | MITSUI CHEMICALS (JP) | 2000-08-22 | — | — | US | disclosed |