Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 5/20 | 0.49 |
| ▸ | MEN1 | O00255 | 2/20 | 0.49 |
| ▸ | PKM | P14618 | 1/20 | 0.49 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | ADRA1B | P35368 | 6/20 | 0.48 |
| ▸ | ADRA1A | P35348 | 2/20 | 0.46 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 3/20 | 0.43 |
| ▸ | NPC1 | O15118 | 2/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22042597 | 0.98 | KMT2A (0.47) | KMT2AMEN1PKMTSHRADRA1B | |
| SCHEMBL22042609 | 0.98 | KMT2A (0.47) | KMT2AMEN1PKMTSHRADRA1B | |
| SCHEMBL22798981 | 0.98 | KMT2A (0.47) | KMT2AMEN1PKMTSHRADRA1B | |
| SCHEMBL22799085 | 0.98 | KMT2A (0.47) | KMT2AMEN1PKMTSHRADRA1B | |
| SCHEMBL22799028 | 0.98 | KMT2A (0.47) | KMT2AMEN1PKMTSHRADRA1B | |
| SCHEMBL22799156 | 0.98 | KMT2A (0.47) | KMT2AMEN1PKMTSHRADRA1B | |
| SCHEMBL8538168 | 0.94 | KMT2A (0.44) | KMT2AMEN1PKMTSHRADRA1B | |
| SCHEMBL312170 | 0.94 | KMT2A (0.50) | KMT2AMEN1PKMTSHRADRA1B | |
| SCHEMBL8071932 | 0.92 | ADRA1B (0.43) | KMT2AMEN1PKMTSHRADRA1B | |
| SCHEMBL10981771 | 0.92 | ADRA1B (0.43) | KMT2AMEN1PKMTSHRADRA1B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5851274-A | Ink jet ink compositions and processes for high resolution and high speed printing | XEROX CORPORATION (US) | 1998-12-22 | — | — | US | claimed |
| EP-0853108-A1 | Ink jet ink compositions and processes for high resolution and high speed printing | XEROX CORPORATION (US) | 1998-07-15 | — | — | EP | claimed |
| EP-0124274-B1 | ELECTRON BEAM SENSITIVE MIXTURE RESIST | GAF CORPORATION (US) | 1988-06-22 | — | — | EP | claimed |
| EP-0088977-B1 | ELECTRON BEAM SENSITIVE RESIST | GAF CORPORATION (US) | 1988-06-01 | — | — | EP | claimed |
| EP-0126652-B1 | ELECTRON BEAM SENSITIVE MIXTURE RESIST | GAF CORPORATION (US) | 1987-04-22 | — | — | EP | claimed |
| EP-0126652-A1 | Electron beam sensitive mixture resist | GAF CORPORATION (US) | 1984-11-28 | — | — | EP | claimed |
| EP-0124274-A2 | Electron beam sensitive mixture resist | GAF CORPORATION (US) | 1984-11-07 | — | — | EP | claimed |
| US-4448875-A | HALF-ESTER OR -AMIDE OF ALKYL VINYL ETHER-MALEIC ANHYDRIDE COPOLYMER | GAF CORPORATION (US) | 1984-05-15 | — | — | US | claimed |
| EP-0088977-A2 | Electron beam sensitive resist | GAF CORPORATION (US) | 1983-09-21 | — | — | EP | claimed |
| US-4375398-A | CROSSLINKING, VINYL ETHER | GAF CORPORATION (US) | 1983-03-01 | — | — | US | claimed |
| US-12447752-B2 | Ink jet recording method and ink jet recording apparatus | CANON KABUSHIKI KAISHA (JP) | 2025-10-21 | — | — | US | disclosed |
| US-20240408863-A1 | INK JET RECORDING METHOD AND INK JET RECORDING APPARATUS | CANON KK (JP) | 2024-12-12 | — | — | US | disclosed |
| US-12018121-B2 | (Poly)alkylene glycol-containing compound | NIPPON SHOKUBAI CO., LTD. (JP) | 2024-06-25 | — | — | US | disclosed |
| US-20230158809-A1 | INK JET RECORDING METHOD AND INK JET RECORDING APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20220073678-A1 | (POLY)ALKYLENE GLYCOL-CONTAINING COMPOUND | NIPPON SHOKUBAI CO., LTD. (JP) | 2022-03-10 | — | — | US | disclosed |
| EP-0124274-A2 | Electron beam sensitive mixture resist | GAF CORPORATION (US) | 1984-11-07 | — | — | EP | disclosed |
| US-4448876-A | Electron beam sensitive resist | GAF CORPORATION (US) | 1984-05-15 | — | — | US | disclosed |
| US-4448875-A | HALF-ESTER OR -AMIDE OF ALKYL VINYL ETHER-MALEIC ANHYDRIDE COPOLYMER | GAF CORPORATION (US) | 1984-05-15 | — | — | US | disclosed |
| EP-0088977-A2 | Electron beam sensitive resist | GAF CORPORATION (US) | 1983-09-21 | — | — | EP | disclosed |
| US-4375398-A | CROSSLINKING, VINYL ETHER | GAF CORPORATION (US) | 1983-03-01 | — | — | US | disclosed |