SCHEMBL439983

SCHEMBL439983

CB(C)B(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10104466 0.68
SCHEMBL49393 0.67
SCHEMBL11959793 0.63
SCHEMBL9480550 0.60
SCHEMBL3887811 0.60
SCHEMBL17036073 0.60
Water SCHEMBL436199 0.60
Ammonia Solution, Strong SCHEMBL2467040 0.60
SCHEMBL313893 0.55
SCHEMBL1030695 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 79 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119684096-A Method for removing benzyl protecting group by using activated water and application of method in controllable release of medicine 南京农业大学 2025-03-25 CN claimed
CN-116497346-A Reduction solution for ionic palladium and preparation method and application thereof 深圳市富利特科技有限公司 2023-07-28 CN claimed
CN-119684096-A Method for removing benzyl protecting group by using activated water and application of method in controllable release of medicine 南京农业大学 2025-03-25 CN disclosed
US-11834447-B2 Indole derivatives and use thereof PURDUE PHARMA L.P. (US) 2023-12-05 US disclosed
CN-116497346-A Reduction solution for ionic palladium and preparation method and application thereof 深圳市富利特科技有限公司 2023-07-28 CN disclosed
US-11702751-B2 Non-conformal high selectivity film for etch critical dimension control APPLIED MATERIALS, INC. (US) 2023-07-18 US disclosed
EP-3397400-B1 USE OF REACTIVE FLUIDS IN ADDITIVE MANUFACTURING AND THE PRODUCTS MADE THEREFROM MATHESON TRI GAS INC (US) 2023-06-14 EP disclosed
EP-4181241-A1 H20 - BASED ELECTROCHEMICAL HYDROGEN - CATALYST POWER SYSTEM Brilliant Light Power, Inc. (US) 2023-05-17 EP disclosed
CN-114450773-A Non-conformal high selectivity films for etch critical dimension control 应用材料公司 2022-05-06 CN disclosed
US-20210047733-A1 Non-Conformal High Selectivity Film For Etch Critical Dimension Control APPLIED MATERIALS, INC. (US) 2021-02-18 US disclosed
CN-105579436-B Onium salts and compositions comprising the same 旭化成株式会社 2020-12-22 CN disclosed
WO-2008085804-A2 SYSTEM AND METHOD OF COMPUTING AND RENDERING THE NATURE OF MOLECULES, MOLECULAR IONS, COMPOUNDS AND MATERIALS BLACKLIGHT POWER, INC. (US) 2008-07-17 WO disclosed
US-20080064703-A1 Fused bicycloheterocycle substituted quinuclidine derivatives ABBVIE INC. 2008-03-13 US disclosed
US-7309699-B2 3-Quinuclidinyl amino-substituted biaryl derivatives ABBOTT LABORATORIES (US) 2007-12-18 US disclosed
US-20070275975-A1 3-QUINUCLIDINYL AMINO-SUBSTITUTED BIARYL DERIVATIVES JI JIANGUO 2007-11-29 US disclosed
US-20070066592-A1 Fused bicycloheterocycle substituted quinuclidine derivatives ABBVIE INC. 2007-03-22 US disclosed
US-20070060588-A1 Fused bicycloheterocycle substituted quinuclidine derivatives ABBOTT LABORATORIES 2007-03-15 US disclosed
US-7160876-B2 Fused bicycloheterocycle substituted quinuclidine derivatives ABBOTT LABORATORIES (US) 2007-01-09 US disclosed
US-6490984-B1 CONTACTING FLUE GAS WITH AT LEAST ONE OF SODIUM PHOSPHITE, CALCIUM PHOSPHATE, SODIUM HYPOPHOSPHITE, AND CALCIUM AS REDUCING AGENTS TO INHIBIT FORMATION OF DIOXINS IN FLUE GASES MIYOSHI YUSHI KABUSHIKI KAISHA (JP) 2002-12-10 US disclosed
EP-1016446-A1 Method of making flue gas harmless MIYOSHI YUSHI KABUSHIKI KAISHA (JP) 2000-07-05 EP disclosed