⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12985615 | 0.77 | — | — | |
| SCHEMBL4395098 | 0.75 | — | — | |
| SCHEMBL28129649 | 0.75 | — | — | |
| SCHEMBL83532 | 0.75 | — | — | |
| SCHEMBL22414209 | 0.74 | — | — | |
| SCHEMBL17029117 | 0.74 | — | — | |
| SCHEMBL423938 | 0.74 | — | — | |
| SCHEMBL24651311 | 0.74 | — | — | |
| SCHEMBL83374 | 0.73 | — | — | |
| SCHEMBL10385536 | 0.73 | TRPM8 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4372019-A1 | NOVEL (METH)ACRYLAMIDE POLYMER, RESIN COMPOSITION CONTAINING SAME, AND MOLDED BODY THEREOF | Nippon Soda Co., Ltd. (JP) | 2024-05-22 | — | — | EP | disclosed |
| US-11834390-B2 | Adhesive composition | NIPPON SODA CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| WO-2023190374-A1 | DIPHENYL(METH)ACRYLAMIDE-CONTAINING THERMOSETTING RESIN COMPOSITION AND CURED PRODUCT THEREFROM | 日本曹達株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-20230118487-A1 | TWO-COMPONENT ADHESIVE COMPOSITION | NIPPON SODA CO., LTD. (JP) | 2023-04-20 | — | — | US | disclosed |
| US-20230120998-A1 | ADHESIVE COMPOSITION | NIPPON SODA CO., LTD. (JP) | 2023-04-20 | — | — | US | disclosed |
| EP-4130179-A1 | TWO-COMPONENT ADHESIVE COMPOSITION | Nippon Soda Co., Ltd. (JP) | 2023-02-08 | — | — | EP | disclosed |
| EP-4130166-A1 | ADHESIVE COMPOSITION | Nippon Soda Co., Ltd. (JP) | 2023-02-08 | — | — | EP | disclosed |
| WO-2023286714-A1 | NOVEL (METH)ACRYLAMIDE POLYMER, RESIN COMPOSITION CONTAINING SAME, AND MOLDED BODY THEREOF | 日本曹達株式会社 | 2023-01-19 | — | — | WO | disclosed |
| US-20210347726-A1 | ADHESIVE COMPOSITION | NIPPON SODA CO., LTD. (JP) | 2021-11-11 | — | — | US | disclosed |
| EP-3862407-A1 | ADHESIVE COMPOSITION | Nippon Soda Co., Ltd. (JP) | 2021-08-11 | — | — | EP | disclosed |
| US-20060088786-A1 | Rewritable optical information recording medium, recording and reproducing methods, as well as recording and reproducing apparatus | MITSUI CHEMICALS, INC. (JP) | 2006-04-27 | — | — | US | disclosed |
| US-20050208425-A1 | Imide compound and optical recording media made by using the same | YAMAMOTO CHEMICALS, INC. (JP) | 2005-09-22 | — | — | US | disclosed |
| EP-1180765-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS INC (JP) | 2005-04-06 | — | — | EP | disclosed |
| EP-1484191-A1 | REWRITABLE OPTICAL INFORMATION RECORDING MEDIUM AND RECORDING/REPRODUCING METHOD, RECORDING/REPRODUCING DEVICE | Sony Corporation (JP) | 2004-12-08 | — | — | EP | disclosed |
| EP-1445115-A1 | IMIDE COMPOUNDS AND OPTICAL RECORDING MEDIA MADE BY USING THE SAME | Mitsui Chemicals, Inc. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-6627288-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS, INC. (JP) | 2003-09-30 | — | — | US | disclosed |
| US-20030091931-A1 | Benzbisazole compound and optical recording medium containing the compound | MITSUI CHEMICALS, INC. (JP) | 2003-05-15 | — | — | US | disclosed |
| EP-1245571-A1 | BENZBISAZOLE COMPOUND AND OPTICAL RECORDING MEDIUM CONTAINING THE COMPOUND | Mitsui Chemicals, Inc. (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1180765-A1 | Optical recording medium and porphycene compound | Mitsui Chemicals, Inc. (JP) | 2002-02-20 | — | — | EP | disclosed |
| US-6106999-A | SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS | MITSUI CHEMICALS (JP) | 2000-08-22 | — | — | US | disclosed |