Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4406138 | 0.92 | ALDH1A1 (0.30) | — | |
| SCHEMBL4399265 | 0.89 | TSHR (0.33) | TSHR | |
| SCHEMBL24760637 | 0.88 | TSHR (0.30) | TSHR | |
| SCHEMBL955117 | 0.87 | ALDH1A1 (0.32) | — | |
| SCHEMBL20382234 | 0.86 | DPP4 (0.34) | — | |
| SCHEMBL4345289 | 0.84 | TSHR (0.36) | TSHR | |
| SCHEMBL4406146 | 0.82 | TSHR (0.36) | TSHR | |
| SCHEMBL4406141 | 0.81 | — | — | |
| SCHEMBL9244832 | 0.80 | TSHR (0.36) | TSHR | |
| SCHEMBL4400976 | 0.80 | TSHR (0.36) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106980235-A | Chemically amplified photoresist composition and process for its use and its application method | 国际商业机器公司 | 2017-07-25 | — | — | CN | claimed |
| CN-102472971-B | chemically amplified photoresist composition and method of use thereof | 国际商业机器公司 | 2016-12-07 | — | — | CN | claimed |
| CN-106980235-A | Chemically amplified photoresist composition and process for its use and its application method | 国际商业机器公司 | 2017-07-25 | — | — | CN | disclosed |
| US-8298746-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-30 | — | — | US | disclosed |
| US-8173352-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-05-08 | — | — | US | disclosed |
| US-8173352-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-05-08 | — | — | US | disclosed |
| US-8168366-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-01 | — | — | US | disclosed |
| US-8168366-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-01 | — | — | US | disclosed |
| US-8003296-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-23 | — | — | US | disclosed |
| US-20110008727-A1 | Low Activation Energy Photoresist Composition and Process for Its Use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-01-13 | — | — | US | disclosed |
| US-20110008727-A1 | Low Activation Energy Photoresist Composition and Process for Its Use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-01-13 | — | — | US | disclosed |
| US-7575850-B2 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-18 | — | — | US | disclosed |
| US-7566522-B2 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-07-28 | — | — | US | disclosed |
| US-7476492-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-13 | — | — | US | disclosed |
| US-7476492-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-13 | — | — | US | disclosed |
| US-20080193874-A1 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-08-14 | — | — | US | disclosed |
| US-20080166660-A1 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-07-10 | — | — | US | disclosed |
| US-20070275324-A1 | Low activation energy photoresist composition and process for its use | GLOBALFOUNDRIES U.S. INC. | 2007-11-29 | — | — | US | disclosed |
| US-20070275324-A1 | Low activation energy photoresist composition and process for its use | GLOBALFOUNDRIES U.S. INC. | 2007-11-29 | — | — | US | disclosed |
| US-7205090-B2 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-17 | — | — | US | disclosed |