Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2A6 | P11509 | 6/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4402544 | 0.92 | CYP2A6 (0.33) | CYP2A6 | |
| SCHEMBL4743755 | 0.90 | CYP2A6 (0.32) | CYP2A6 | |
| SCHEMBL4401561 | 0.86 | ALDH1A1 (0.33) | CYP2A6ALDH1A1KDM4EHSD17B10TDP1 | |
| SCHEMBL4441288 | 0.82 | CYP2A6 (0.32) | CYP2A6 | |
| SCHEMBL4745713 | 0.80 | CYP2A6 (0.33) | CYP2A6 | |
| SCHEMBL4408077 | 0.78 | — | — | |
| SCHEMBL4401577 | 0.76 | CYP2A6 (0.41) | CYP2A6ALDH1A1KDM4EHSD17B10TDP1 | |
| SCHEMBL4448548 | 0.75 | — | — | |
| SCHEMBL4438927 | 0.73 | CYP2A6 (0.30) | CYP2A6 | |
| SCHEMBL30972495 | 0.70 | CYP2A6 (0.50) | CYP2A6ALDH1A1KDM4EHSD17B10TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8877422-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8877422-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| EP-2447775-B1 | Resist underlayer film composition and patterning process using the same | SHINETSU CHEMICAL CO (JP) | 2013-05-29 | — | — | EP | disclosed |
| US-20120108071-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20120108071-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |