Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | GFER | P55789 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | DPP4 | P27487 | 8/20 | 0.38 |
| ▸ | MTNR1A | P48039 | 2/20 | 0.38 |
| ▸ | HTR2A | P28223 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4403409 | 0.89 | CYP1A2 (0.43) | MEN1KMT2APOLBMAPK1CYP1A2 | |
| SCHEMBL4402562 | 0.84 | CYP1A2 (0.38) | MEN1KMT2APOLBMAPK1CYP1A2 | |
| SCHEMBL4405578 | 0.78 | MEN1 (0.43) | MEN1KMT2APOLBMAPK1CYP1A2 | |
| SCHEMBL15539879 | 0.74 | KDM4E (0.39) | KMT2APOLBKDM4EALDH1A1MAPT | |
| SCHEMBL2971275 | 0.74 | AHR (0.37) | MEN1KMT2ACYP2A6KDM4EALDH1A1 | |
| SCHEMBL4402539 | 0.73 | CYP1A2 (0.40) | MEN1KMT2APOLBMAPK1CYP1A2 | |
| SCHEMBL19382614 | 0.73 | CYP1A2 (0.61) | MEN1KMT2APOLBMAPK1CYP1A2 | |
| SCHEMBL9113863 | 0.73 | STS (0.38) | MEN1KMT2APOLBMAPK1CYP1A2 | |
| SCHEMBL4402594 | 0.73 | HSP90AA1 (0.44) | MEN1KMT2APOLBMAPK1CYP1A2 | |
| SCHEMBL31463289 | 0.73 | GAA (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8877422-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| US-20120108071-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |