Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 4/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | BLM | P54132 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | HTR1A | P08908 | 1/20 | 0.30 |
| ▸ | DRD2 | P14416 | 1/20 | 0.30 |
| ▸ | HTR2A | P28223 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4401557 | 0.85 | — | — | |
| SCHEMBL4448555 | 0.84 | — | — | |
| SCHEMBL4405528 | 0.83 | — | — | |
| SCHEMBL4403390 | 0.81 | — | — | |
| SCHEMBL4403292 | 0.77 | MCL1 (0.32) | — | |
| SCHEMBL10068328 | 0.76 | MEN1 (0.31) | MEN1KMT2ALMNATHRBBLM | |
| SCHEMBL4448559 | 0.71 | CYP2A6 (0.32) | — | |
| SCHEMBL4443404 | 0.71 | — | — | |
| SCHEMBL4401568 | 0.70 | — | — | |
| SCHEMBL10068329 | 0.70 | KDM1A (0.33) | ALDH1A1MEN1KMT2ATDP1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8877422-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8877422-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| EP-2447775-B1 | Resist underlayer film composition and patterning process using the same | SHINETSU CHEMICAL CO (JP) | 2013-05-29 | — | — | EP | disclosed |
| US-20120108071-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20120108071-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| EP-2447775-A1 | Resist underlayer film composition and patterning process using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-05-02 | — | — | EP | disclosed |