SCHEMBL4448559

SCHEMBL4448559

O=Cc1ccc2ccc3c(c2c1)C1C2C=CC(C2)C1C3

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4442946 0.91 CYP2A6 (0.31) CYP2A6
SCHEMBL4438633 0.85
SCHEMBL4405518 0.79 TSHR (0.35)
SCHEMBL4450996 0.79 CYP2A6 (0.32) CYP2A6
SCHEMBL4405529 0.76 MTNR1A (0.45)
SCHEMBL10068329 0.76 KDM1A (0.33)
SCHEMBL4401557 0.74
SCHEMBL4450983 0.73 CYP2A6 (0.31) CYP2A6
SCHEMBL4448555 0.73
SCHEMBL4403292 0.72 MCL1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
EP-2447775-B1 Resist underlayer film composition and patterning process using the same SHINETSU CHEMICAL CO (JP) 2013-05-29 EP disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
EP-2447775-A1 Resist underlayer film composition and patterning process using the same Shin-Etsu Chemical Co., Ltd. (JP) 2012-05-02 EP disclosed