Methylsulfanylmethane

Methylsulfanylmethane

SCHEMBL4409374

CSC.O=S(=O)(Oc1ccc(O)c2ccccc12)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.40

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.40
GAA P10253 3/20 0.40
KMT2A Q03164 3/20 0.40
ESR1 P03372 2/20 0.40
ESR2 Q92731 2/20 0.40
IDO1 P14902 4/20 0.35
CA1 P00915 10/20 0.35
CA2 P00918 10/20 0.35
LDHA P00338 1/20 0.35
EP300 Q09472 2/20 0.35
KAT2B Q92831 2/20 0.35
KAT8 Q9H7Z6 2/20 0.35
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33
TP53 P04637 1/20 0.33
POLB P06746 1/20 0.33
MAPT P10636 1/20 0.33
PKM P14618 1/20 0.33
HPGD P15428 1/20 0.33
ALOX15 P16050 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methylsulfanylmethane SCHEMBL22441905 0.85 ESR1 (0.48) MEN1GAAKMT2AESR1ESR2
SCHEMBL271897 0.78 CA1 (0.33) CA1CA2MMP1MMP2MMP9
SCHEMBL3968936 0.77 CA1 (0.34) CA1CA2
SCHEMBL31299571 0.75 CA1 (0.39) MEN1GAAKMT2ACA1CA2
SCHEMBL3967348 0.75 CA1 (0.34) CA1CA2ALDH1A1HTTMMP1
SCHEMBL3970544 0.74 CA1 (0.35) CA1CA2MMP1MMP2MMP9
SCHEMBL3106273 0.74 CA1 (0.30) CA1CA2
SCHEMBL28614424 0.72 CA2 (0.37) CA1CA2MMP1MMP2MMP9
SCHEMBL31299569 0.72 CA1 (0.38) MEN1GAAKMT2AESR1ESR2
SCHEMBL3222252 0.71 ESR1 (0.55) MEN1GAAKMT2AESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11450445-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2022-09-20 US disclosed
US-20200303086-A1 ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-09-24 US disclosed
US-7638266-B2 Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-12-29 US disclosed
EP-1641848-A1 PHOTORESIST POLYMER COMPOSITIONS JSR Corporation (JP) 2006-04-05 EP disclosed
US-20060035167-A1 Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-02-16 US disclosed
WO-2005003198-A1 PHOTORESIST POLYMER COMPOSITIONS JSR CORPORATION (JP) 2005-01-13 WO disclosed