Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL379269 | 0.84 | CNR2 (0.40) | CNR1CNR2 | |
| SCHEMBL2595375 | 0.84 | CYP3A4 (0.39) | CNR1CNR2 | |
| SCHEMBL31570219 | 0.82 | MEN1 (0.40) | — | |
| SCHEMBL31570218 | 0.82 | MEN1 (0.40) | — | |
| SCHEMBL4451239 | 0.82 | MEN1 (0.40) | — | |
| SCHEMBL30987016 | 0.82 | CYP3A4 (0.38) | CNR1CNR2 | |
| SCHEMBL29238423 | 0.82 | CYP3A4 (0.38) | CNR1CNR2 | |
| SCHEMBL7099279 | 0.82 | CNR1 (0.43) | CNR1CNR2 | |
| SCHEMBL8101394 | 0.80 | CNR1 (0.46) | CNR1CNR2 | |
| SCHEMBL6550109 | 0.80 | CNR1 (0.45) | CNR1CNR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111363264-A | TPE modified material | 昆山市品虹橡塑有限公司 | 2020-07-03 | — | — | CN | claimed |
| EP-1150649-A1 | COSMETIC COMPOSITIONS FOR PHOTOPROTECTION OF THE SKIN AND/OR HAIR CONTAINING A BENZOTRIAZOLE DERIVATIVE AND A TRIAZINE BIS-RESORCINYL | L'OREAL (FR) | 2001-11-07 | — | — | EP | claimed |
| EP-1043013-A1 | Photoprotective compositions containing a benzotriazole derivative, a bis-resorcinyl triazine derivative and a compound having benzoazolyl- or benzodiazolyl groups | L'OREAL (FR) | 2000-10-11 | — | — | EP | claimed |
| WO-2000047176-A1 | COSMETIC COMPOSITIONS FOR PHOTOPROTECTION OF THE SKIN AND/OR HAIR CONTAINING A BENZOTRIAZOLE DERIVATIVE AND A TRIAZINE BIS-RESORCINYL | L'OREAL (FR) | 2000-08-17 | — | — | WO | claimed |
| EP-1027882-A1 | Sunscreening compositions containing a benzotriazole derivative and a compound containing benzoazolyle or benzodiazolyle groups | L'OREAL (FR) | 2000-08-16 | — | — | EP | claimed |
| EP-0216084-B1 | IMPROVED SUNSCREEN AND MOISTURIZER | Richardson-Vicks, Inc. (US) | 1991-01-23 | — | — | EP | claimed |
| EP-4384575-A1 | LASER TRANSPARENT COMPOSITION AND MOLDED ARTICLES MADE THEREFROM | Celanese International Corporation (US) | 2024-06-19 | — | — | EP | disclosed |
| CN-115087702-B | Styrene resin composition, flame-retardant styrene resin composition, molded article, and patch antenna | PS日本株式会社 | 2024-05-31 | — | — | CN | disclosed |
| CN-117836121-A | Thermoplastic resin composition, method for producing molded body, and molded body | 株式会社艾迪科 | 2024-04-05 | — | — | CN | disclosed |
| CN-117143033-A | Particulate ultraviolet absorber and resin composition | 株式会社艾迪科 | 2023-12-01 | — | — | CN | disclosed |
| CN-117143395-A | Particulate ultraviolet absorber and resin composition | 株式会社艾迪科 | 2023-12-01 | — | — | CN | disclosed |
| CN-117143396-A | Particulate ultraviolet absorber and resin composition | 株式会社艾迪科 | 2023-12-01 | — | — | CN | disclosed |
| EP-4281502-A1 | LASER WELDABLE POLYESTER COMPOSITION | Celanese International Corporation (US) | 2023-11-29 | — | — | EP | disclosed |
| EP-0463754-A1 | Stabilization of glutarimide polymers | ROHM AND HAAS COMPANY (US) | 1992-01-02 | — | — | EP | disclosed |
| EP-0231375-B1 | PHOTO-SETTING COMPOSITION | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1990-01-24 | — | — | EP | disclosed |
| EP-0296224-A4 | U.V. STABILIZED ARTICLE AND PROCESS FOR MAKING SAME. | M & T CHEMICALS INC (US) | 1989-04-12 | — | — | EP | disclosed |
| EP-0296224-A1 | U.V. STABILIZED ARTICLE AND PROCESS FOR MAKING SAME | ATOCHEM NORTH AMERICA, INC. (a Pennsylvania corp.) (US) | 1988-12-28 | — | — | EP | disclosed |
| WO-1988004581-A1 | U.V. STABILIZED ARTICLE AND PROCESS FOR MAKING SAME | M AND T CHEMICALS, INC. (US) | 1988-06-30 | — | — | WO | disclosed |
| EP-0231375-A1 | PHOTO-SETTING COMPOSITION | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1987-08-12 | — | — | EP | disclosed |
| US-4401804-A | Deactivation of polyester catalyst residues | EASTMAN KODAK COMPANY (US) | 1983-08-30 | — | — | US | disclosed |