SCHEMBL4451239

SCHEMBL4451239

CC(C)(C)c1ccc(O)c(-c2cccc3[nH]nnc23)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
NPC1 O15118 3/20 0.40
RAB9A P51151 3/20 0.40
NR2F2 P24468 1/20 0.40
ALDH1A1 P00352 3/20 0.40
HPGD P15428 1/20 0.40
ALOX15 P16050 1/20 0.40
HSD17B10 Q99714 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
CYP3A4 P08684 1/20 0.37
CYP2C9 P11712 1/20 0.37
CYP2C19 P33261 1/20 0.37
GAA P10253 3/20 0.37
MAPT P10636 2/20 0.37
PKM P14618 1/20 0.37
RECQL P46063 1/20 0.37
TRPV1 Q8NER1 2/20 0.36
GRM4 Q14833 1/20 0.36
HDAC4 P56524 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31570218 1.00 MEN1 (0.40) MEN1KMT2ANPC1RAB9ANR2F2
SCHEMBL31570219 1.00 MEN1 (0.40) MEN1KMT2ANPC1RAB9ANR2F2
SCHEMBL11784775 0.90 ALDH1A1 (0.41) MEN1KMT2ANPC1RAB9ANR2F2
SCHEMBL9437939 0.87 CNR1 (0.42) MEN1KMT2ANPC1RAB9ANR2F2
SCHEMBL2595375 0.86 CYP3A4 (0.39) MEN1KMT2ANPC1RAB9ANR2F2
SCHEMBL10432050 0.85 MEN1 (0.34) MEN1KMT2ANPC1RAB9ANR2F2
SCHEMBL30987016 0.84 CYP3A4 (0.38) MEN1KMT2ANPC1RAB9ANR2F2
SCHEMBL29238423 0.84 CYP3A4 (0.38) MEN1KMT2ANPC1RAB9ANR2F2
SCHEMBL30940341 0.83 HSP90AA1 (0.44) MEN1KMT2ANPC1RAB9ANR2F2
SCHEMBL28957322 0.83 GABRA1 (0.34) MEN1KMT2ANPC1RAB9ANR2F2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 195 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117597403-A Composition and method for protecting a coating from harmful effects of exposure to UV-C light 塞特工业公司 2024-02-23 CN claimed
CN-116783246-A Compositions and methods for protecting organic polymeric materials from discoloration due to exposure to UV-C light 塞特工业公司 2023-09-19 CN claimed
CN-115160680-B Fluoroplastic film for packaging super-weather-resistant high-cut-off photovoltaic module and preparation method 苏州弘道新材料有限公司 2023-09-15 CN claimed
CN-116745353-A Compositions and methods for protecting organic polymeric materials from the deleterious effects of UV-C light exposure 塞特工业公司 2023-09-12 CN claimed
CN-114149769-B High-reflection black adhesive film and preparation method and application thereof 苏州赛伍应用技术股份有限公司 2023-04-07 CN claimed
CN-115449213-A Yellowing-resistant master batch, thermoplastic polyurethane film, and preparation method and application thereof 上海鑫亘环保科技有限公司 2022-12-09 CN claimed
CN-114920986-A Ultraviolet blocking agent and preparation and application methods thereof 万凯新材料股份有限公司 2022-08-19 CN claimed
CN-114316846-A Glue film composition containing polystyrene microspheres and preparation method and application thereof 苏州赛伍应用技术股份有限公司 2022-04-12 CN claimed
CN-114149769-A High-reflection black adhesive film and preparation method and application thereof 苏州赛伍应用技术股份有限公司 2022-03-08 CN claimed
CN-112055728-A Particulate stabilizer composition for polymer resins and process for producing the same 塞特工业公司 2020-12-08 CN claimed
CN-111116982-A Stabilizer composition and method for protecting organic materials from UV light and thermal degradation using the same 塞特工业公司 2020-05-08 CN claimed
CN-115698169-B Ethylene-vinyl alcohol copolymer resin composition, multilayer structure, and package 三菱化学株式会社 2024-06-25 CN disclosed
CN-118235072-A Optical film and polarizing plate 东曹株式会社 2024-06-21 CN disclosed
CN-118043298-A (Hetero) aryl-substituted bisphenol compound and thermoplastic resin 罗伊特化学仪器制造公司 2024-05-14 CN disclosed
CN-117641746-A Transparent conductive substrate and double-sided photolithography method using same 杜邦电子公司 2024-03-01 CN disclosed
CN-1374536-A Polarizer protective film FUJI PHOTO FILM CO LTD (JP) 2002-10-16 CN disclosed
EP-1227113-A1 LOWLY LACTONE-MODIFIED REACTIVE MONOMER COMPOSITION, ACRYLIC POLYOL RESINS PRODUCED WITH THE SAME, CURABLE RESIN COMPOSITIONS AND COATING COMPOSITIONS DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) 2002-07-31 EP disclosed
US-4368258-A HYDROPHOBIC SUBSTANCE, WATER-MISCIBLE SOLVENT KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1983-01-11 US disclosed
US-4232118-A METHINECYANINE DYES KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1980-11-04 US disclosed
US-3960570-A ALPHA-ACYLACETOAMIDE YELLOW DYE FORMING COUPLER FUJI PHOTO FILM CO., LTD. (JA) 1976-06-01 US disclosed