Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.51 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
| ▸ | FAAH | O00519 | 2/20 | 0.41 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.39 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.39 |
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
| ▸ | ZDHHC7 | Q9NXF8 | 1/20 | 0.39 |
| ▸ | LCK | P06239 | 1/20 | 0.38 |
| ▸ | PPARD | Q03181 | 1/20 | 0.38 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.38 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11432793 | 1.00 | TSHR (0.51) | TSHRMAPTFAAHGPR84FFAR1 | |
| SCHEMBL28444295 | 1.00 | TSHR (0.51) | TSHRMAPTFAAHGPR84FFAR1 | |
| SCHEMBL27854905 | 1.00 | TSHR (0.51) | TSHRMAPTFAAHGPR84FFAR1 | |
| SCHEMBL3323181 | 1.00 | TSHR (0.51) | TSHRMAPTFAAHGPR84FFAR1 | |
| SCHEMBL13275506 | 0.98 | TSHR (0.49) | TSHRMAPTFAAHGPR84FFAR1 | |
| Ethylene Glycol SCHEMBL5940422 | 0.95 | TSHR (0.47) | TSHRMAPTFAAHGPR84FFAR1 | |
| SCHEMBL15756037 | 0.93 | TSHR (0.46) | TSHRMAPTFAAHCES2CA2 | |
| SCHEMBL2563105 | 0.85 | ALDH1A1 (0.43) | TSHRMAPT | |
| SCHEMBL29234908 | 0.85 | MAPT (0.44) | TSHRMAPTFAAHGPR84FFAR1 | |
| SCHEMBL28988449 | 0.85 | MAPT (0.44) | TSHRMAPTFAAHGPR84FFAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116001378-B | Perovskite quantum dot composite film and preparation method thereof | 中国乐凯集团有限公司 | 2024-10-18 | — | — | CN | claimed |
| CN-114736579-B | Fluorocarbon coating, preparation method thereof and multilayer film application | 安徽屹珹新材料科技有限公司 | 2024-05-10 | — | — | CN | claimed |
| CN-115850861-B | Polypropylene hydrophobic material and preparation method and application thereof | 湖北大学 | 2024-04-26 | — | — | CN | claimed |
| CN-116001378-A | Perovskite quantum dot composite film and preparation method thereof | 中国乐凯集团有限公司 | 2023-04-25 | — | — | CN | claimed |
| US-8585917-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-11-19 | — | — | US | claimed |
| US-8084367-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD (KR) | 2011-12-27 | — | — | US | claimed |
| US-20070293054-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | SAMSUNG ELECTRONICS CO., LTD. | 2007-12-20 | — | — | US | claimed |
| CN-116001378-B | Perovskite quantum dot composite film and preparation method thereof | 中国乐凯集团有限公司 | 2024-10-18 | — | — | CN | disclosed |
| CN-114736579-B | Fluorocarbon coating, preparation method thereof and multilayer film application | 安徽屹珹新材料科技有限公司 | 2024-05-10 | — | — | CN | disclosed |
| CN-115850861-B | Polypropylene hydrophobic material and preparation method and application thereof | 湖北大学 | 2024-04-26 | — | — | CN | disclosed |
| WO-2024085157-A1 | LAMINATE | 東洋アルミニウム株式会社 | 2024-04-25 | — | — | WO | disclosed |
| EP-4342591-A1 | LAYERED PRODUCT | TOYO ALUMINIUM KABUSHIKI KAISHA (JP) | 2024-03-27 | — | — | EP | disclosed |
| CN-117362703-A | Hydrophobic and high-temperature-resistant nylon isolating film and preparation method thereof | 湖北大学 | 2024-01-09 | — | — | CN | disclosed |
| US-7384879-B2 | Selection and deposition of nanoparticles using CO2-expanded liquids | AUBURN UNIVERSITY (US) | 2008-06-10 | — | — | US | disclosed |
| US-20070293054-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | SAMSUNG ELECTRONICS CO., LTD. | 2007-12-20 | — | — | US | disclosed |
| US-20070243716-A1 | Selection and deposition of nanoparticles using CO2-expanded liquids | AUBURN UNIVERSITY | 2007-10-18 | — | — | US | disclosed |
| EP-1809793-A2 | SELECTION AND DEPOSITION OF NANOPARTICLES USING CO2-EXPANDED LIQUIDS | Auburn University (US) | 2007-07-25 | — | — | EP | disclosed |
| WO-2007033506-A1 | FUNCTIONALIZED PHOTOREACTIVE COMPOUNDS | ROLIC AG (CH) | 2007-03-29 | — | — | WO | disclosed |
| WO-2007013881-A2 | SELECTION AND DEPOSITION OF NANOPARTICLES USING CO2-EXPANDED LIQUIDS | AUBURN UNIVERSITY (US) | 2007-02-01 | — | — | WO | disclosed |
| EP-0638095-A1 | METHOD OF MAKING FLUOROPOLYMERS | UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) | 1995-02-15 | — | — | EP | disclosed |