⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12616582 | 0.78 | SMN1; SMN2 (0.39) | — | |
| SCHEMBL576449 | 0.76 | CA1 (0.43) | — | |
| SCHEMBL5346800 | 0.76 | — | — | |
| SCHEMBL20079554 | 0.76 | — | — | |
| SCHEMBL24312513 | 0.73 | — | — | |
| SCHEMBL979754 | 0.73 | — | — | |
| SCHEMBL10046445 | 0.73 | — | — | |
| SCHEMBL981185 | 0.73 | — | — | |
| SCHEMBL893868 | 0.73 | — | — | |
| SCHEMBL981175 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 191 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3557684-B1 | LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME | MITSUBISHI CHEM CORP (JP) | 2024-01-24 | — | — | EP | disclosed |
| US-20230378435-A1 | LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-11-23 | — | — | US | disclosed |
| US-11769871-B2 | Lithium secondary batteries and nonaqueous electrolyte for use in the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-09-26 | — | — | US | disclosed |
| EP-3830204-B1 | ANAEROBICALLY CURABLE COMPOSITIONS CONTAINING ALPHA-METHYLENE-LACTONES | HENKEL AG & CO KGAA (DE) | 2023-09-13 | — | — | EP | disclosed |
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20230183574-A1 | LIQUID CRYSTAL COMPOSITION, LIQUID CRYSTAL CURED LAYER, OPTICAL FILM, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11616253-B2 | Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-03-28 | — | — | US | disclosed |
| US-20230025932-A1 | NOVEL FUNCTIONALIZED LACTONES AS MODULATORS OF THE 5-HYDROXYTRYPTAMINE RECEPTOR 7 AND THEIR METHOD OF USE | PRAEVENTIX, LLC | 2023-01-26 | — | — | US | disclosed |
| US-20220220381-A1 | OPTICALLY ANISOTROPIC LAYER, OPTICAL FILM, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2022-07-14 | — | — | US | disclosed |
| US-11367899-B2 | Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2022-06-21 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| WO-2005063763-A1 | NOVEL FUSED PYRROLOCARBAZOLES | CEPHALON, INC. (US) | 2005-07-14 | — | — | WO | disclosed |
| US-6677419-B1 | REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-01-13 | — | — | US | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
| EP-0186694-B1 | PROCESS FOR RECOVERY OF METHACRYLIC ACID | AMOCO CORPORATION (US) | 1990-08-29 | — | — | EP | disclosed |
| EP-0186694-A4 | PROCESS FOR RECOVERY OF METHACRYLIC ACID. | AMOCO CORP (US) | 1986-11-26 | — | — | EP | disclosed |
| EP-0186694-A1 | PROCESS FOR RECOVERY OF METHACRYLIC ACID. | AMOCO CORP (US) | 1986-07-09 | — | — | EP | disclosed |
| US-4599144-A | FRACTIONAL DISTILLATION | STANDARD OIL COMPANY (INDIANA) (US) | 1986-07-08 | — | — | US | disclosed |
| WO-1986000236-A1 | PROCESS FOR RECOVERY OF METHACRYLIC ACID | AMOCO CORPORATION (US) | 1986-01-16 | — | — | WO | disclosed |