SCHEMBL10046445

SCHEMBL10046445

CC1(C)CC(O)OC1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7313282 0.82
SCHEMBL11987407 0.79
SCHEMBL24796620 0.74 PTPN1 (0.32)
SCHEMBL441723 0.73
SCHEMBL24312513 0.71
SCHEMBL893868 0.71
SCHEMBL20086666 0.71 APLNR (0.37)
SCHEMBL7755872 0.71 HTR7 (0.42)
SCHEMBL20630755 0.69
SCHEMBL18227494 0.69 HTR7 (0.47)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240018161-A1 MODULATORS OF CYSTIC FIBROSIS TRANSMEMBRANE CONDUCTANCE REGULATOR VERTEX PHARMA (US) 2024-01-18 US disclosed
US-20240018161-A1 MODULATORS OF CYSTIC FIBROSIS TRANSMEMBRANE CONDUCTANCE REGULATOR VERTEX PHARMA (US) 2024-01-18 US disclosed
EP-4225447-A1 MODULATORS OF CYSTIC FIBROSIS TRANSMEMBRANE CONDUCTANCE REGULATOR Vertex Pharmaceuticals Incorporated (US) 2023-08-16 EP disclosed
WO-2022076625-A1 MODULATORS OF CYSTIC FIBROSIS TRANSMEMBRANE CONDUCTANCE REGULATOR VERTEX PHARMACEUTICALS INCORPORATED (US) 2022-04-14 WO disclosed
EP-1918778-B1 Compositions and processes for immersion lithography ROHM & HAAS ELECT MAT (US) 2016-08-03 EP disclosed
US-9244355-B2 Compositions and processes for immersion lithography ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) 2016-01-26 US disclosed
US-9244355-B2 Compositions and processes for immersion lithography ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) 2016-01-26 US disclosed
US-20150057452-A1 SELECTIVE ANDROGEN RECEPTOR MODULATORS CATYLIX, INC. (US) 2015-02-26 US disclosed
EP-2420891-A1 Compositions and processes for immersion lithography Rohm and Haas Electronic Materials LLC (US) 2012-02-22 EP disclosed
US-20080193872-A1 Applying on photoresist, a photoactive component, and material(s) having a water contact angle changeable by base treatment; activation by immersion exposing to radiation; reduced leaching; pentafluoroacrylate-ethyl cyclopentyl methacrylate-trimethylolpropane triacrylate terpolymer ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-08-14 US disclosed
US-20080193872-A1 Applying on photoresist, a photoactive component, and material(s) having a water contact angle changeable by base treatment; activation by immersion exposing to radiation; reduced leaching; pentafluoroacrylate-ethyl cyclopentyl methacrylate-trimethylolpropane triacrylate terpolymer ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-08-14 US disclosed