⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2122117 | 0.87 | AKR1C1 (0.31) | — | |
| SCHEMBL314925 | 0.87 | — | — | |
| SCHEMBL8841260 | 0.74 | TP53 (0.35) | — | |
| SCHEMBL11285669 | 0.69 | TP53 (0.32) | — | |
| SCHEMBL1470295 | 0.68 | — | — | |
| Hydrochloric Acid SCHEMBL3142298 | 0.68 | FFAR3 (0.44) | — | |
| SCHEMBL204371 | 0.68 | FFAR3 (0.44) | — | |
| Hydrochloric Acid SCHEMBL628949 | 0.68 | FFAR3 (0.44) | — | |
| SCHEMBL9346731 | 0.67 | FFAR3 (0.33) | — | |
| SCHEMBL11164592 | 0.64 | TP53 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024120097-A1 | POLYIMIDE ELECTROPHORETIC COATING, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF | 合肥汉之和新材料科技有限公司 | 2024-06-13 | — | — | WO | claimed |
| CN-117700751-A | Reactive silsesquioxane, synthesis method thereof, polyimide composition containing reactive silsesquioxane and polyimide film | 苏州聚萃材料科技有限公司 | 2024-03-15 | — | — | CN | claimed |
| JP-5249473-A | — | — | None | — | — | JP | disclosed |
| WO-2024148707-A1 | POLYIMIDE PRECURSOR AND SYNTHETIC METHOD THEREFOR, AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING POLYIMIDE PRECURSOR | 深圳先进电子材料国际创新研究院 | 2024-07-18 | — | — | WO | disclosed |
| WO-2024120097-A1 | POLYIMIDE ELECTROPHORETIC COATING, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF | 合肥汉之和新材料科技有限公司 | 2024-06-13 | — | — | WO | disclosed |
| CN-118146713-A | Polyimide electrophoretic paint, preparation method and application thereof | 合肥汉之和新材料科技有限公司 | 2024-06-07 | — | — | CN | disclosed |
| CN-117700751-A | Reactive silsesquioxane, synthesis method thereof, polyimide composition containing reactive silsesquioxane and polyimide film | 苏州聚萃材料科技有限公司 | 2024-03-15 | — | — | CN | disclosed |
| CN-117003985-A | Preparation method of catalytic waste polyurethane degradation recycling material | 桂林航天工业学院 | 2023-11-07 | — | — | CN | disclosed |
| CN-116841121-A | Photosensitive resin composition, method for producing pattern cured film, and use thereof | 武汉柔显科技股份有限公司 | 2023-10-03 | — | — | CN | disclosed |
| CN-115867866-A | Method for producing cured product, resin composition, developer, method for producing laminate, and method for producing semiconductor device | 富士胶片株式会社 | 2023-03-28 | — | — | CN | disclosed |
| CN-112939915-B | Diamine monomer for photosensitive resin, polyimide precursor, photosensitive resin composition, and use thereof | 武汉柔显科技股份有限公司 | 2022-10-14 | — | — | CN | disclosed |
| WO-2007078153-A1 | COMPOSITION FOR LIQUID CRYSTAL ALIGNING, LIQUID CRYSTAL ALIGNING LAYER PREPARED FROM THE SAME, AND LIQUID CRYSTAL DISPLAY COMPRISING THE SAME | LG CHEM. LTD. (KR) | 2007-07-12 | — | — | WO | disclosed |
| US-20070154656-A1 | Composition for liquid crystal aligning, liquid crystal aligning layer prepared from the same, and liquid crystal display comprising the same | LG CHEM. LTD. (KR) | 2007-07-05 | — | — | US | disclosed |
| US-20050260359-A1 | Liquid crystal display device | HITACHI DISPLAYS, LTD. | 2005-11-24 | — | — | US | disclosed |
| US-6124381-A | CURING ACCELERATOR IS A 2-((MONO- OR DI-ALKYL)AMINO, MORPHOLINO, PIPERIDINO, METHYL OR PHENYL)-4,6-SUBSTITUTED DIAMINO-1,3,5-TRIAZINE OF GIVEN FORMULA; POT LIFE, STORAGE STABILITY, AND WORKABILITY | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2000-09-26 | — | — | US | disclosed |
| US-6071670-A | PHOTORESIST RESIN COMPRISING PHOTOACID GENERATING COMPOUND AND AN ACID HYDROLYZABLE OLIGOMER HAVING ALICYCLIC OR POLYCONDENSED AROMATIC BACKBONE; ALKALI DEVELOPMENT WITH HIGH RESOLUTION, DRY ETCH RESISTANCE | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-06-06 | — | — | US | disclosed |
| EP-0834523-A1 | EPOXY/ACID ANHYDRIDE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 1998-04-08 | — | — | EP | disclosed |
| JP-H05249473-A | ORIENTED FILM AND LIQUID CRYSTAL DISPLAY BODY | SEIKO EPSON CORP | 1993-09-28 | — | — | JP | disclosed |
| US-4366302-A | HEAT RESISTANCE CURING AGENTS | LORD CORPORATION (US) | 1982-12-28 | — | — | US | disclosed |
| US-3951920-A | Permselective polymeric membrane prepared from polybenzimidazoles | TEIJIN LIMITED (JA) | 1976-04-20 | — | — | US | disclosed |