Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RECQL | P46063 | 1/20 | 0.46 |
| ▸ | MGLL | Q99685 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | HPGD | P15428 | 2/20 | 0.38 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
| ▸ | ACE | P12821 | 1/20 | 0.37 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | DPP4 | P27487 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13321385 | 1.00 | RECQL (0.46) | RECQLMGLLALDH1A1HPGDGLA | |
| SCHEMBL16468333 | 0.92 | PHGDH (0.40) | RECQLMGLLALDH1A1HPGDTSHR | |
| SCHEMBL304741 | 0.85 | RECQL (0.43) | RECQLMGLLALDH1A1HPGDGLA | |
| SCHEMBL304740 | 0.85 | RECQL (0.43) | RECQLMGLLALDH1A1HPGDGLA | |
| SCHEMBL13301215 | 0.85 | RECQL (0.47) | RECQLMGLLALDH1A1HPGDGLA | |
| SCHEMBL16468175 | 0.79 | KMT2A (0.45) | RECQLMGLLALDH1A1HPGDGLA | |
| SCHEMBL20473387 | 0.78 | HTR2C (0.46) | ALDH1A1KMT2AMEN1TSHRKDM4E | |
| SCHEMBL12787401 | 0.77 | GAA (0.42) | ALDH1A1HPGDKMT2ADPP4 | |
| SCHEMBL4074595 | 0.77 | ALDH1A1 (0.34) | ALDH1A1HPGDKMT2AMEN1TSHR | |
| SCHEMBL4074294 | 0.77 | ALDH1A1 (0.34) | ALDH1A1HPGDKMT2AMEN1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260022202-A1 | UV-CURABLE COMPOSITION AND USE THEREOF | DOW TORAY CO LTD (JP) | 2026-01-22 | — | — | US | disclosed |
| EP-4636011-A1 | POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-22 | — | — | EP | disclosed |
| US-12405531-B2 | Organic EL display device, production method for cured product, and production method for organic EL display device | TORAY INDUSTRIES, INC. (JP) | 2025-09-02 | — | — | US | disclosed |
| US-12339586-B2 | Photocurable resin composition containing self-crosslinkable polymer | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-24 | — | — | US | disclosed |
| US-20250172869-A1 | WAFER END PROTECTIVE-FILM FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING | NISSAN CHEMICAL CORPORATION (JP) | 2025-05-29 | — | — | US | disclosed |
| EP-4553100-A1 | POLYMER, POSITIVE AND NEGATIVE PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-05-14 | — | — | EP | disclosed |
| CN-119955091-A | Polymer, positive-type negative-type photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protective film, and electronic component | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| US-20250147420-A1 | Polymer, Positive And Negative Photosensitive Resin Compositions, Patterning Process, Method For Forming Cured Film, Interlayer Insulating Film, Surface Protective Film, And Electronic Component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-05-08 | — | — | US | disclosed |
| US-20250116936-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKABLE POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2025-04-10 | — | — | US | disclosed |
| EP-4492142-A1 | WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING | Nissan Chemical Corporation (JP) | 2025-01-15 | — | — | EP | disclosed |
| US-20160108250-A1 | CURABLE COMPOSITION INCLUDING SILOXANE OLIGOMER AND INORGANIC FINE PARTICLES | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-04-21 | — | — | US | disclosed |
| EP-2987809-A1 | CURABLE COMPOSITION COMPRISING SILOXANE OLIGOMER AND INORGANIC MICROPARTICLES | Nissan Chemical Industries, Ltd. (JP) | 2016-02-24 | — | — | EP | disclosed |
| US-20150293449-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2015-10-15 | — | — | US | disclosed |
| US-9029270-B2 | Phenolic resin composition, and methods for manufacturing cured relief pattern and semiconductor | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2015-05-12 | — | — | US | disclosed |
| US-9029270-B2 | Phenolic resin composition, and methods for manufacturing cured relief pattern and semiconductor | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2015-05-12 | — | — | US | disclosed |
| US-20150050596-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2015-02-19 | — | — | US | disclosed |
| US-20130168829-A1 | PHENOLIC RESIN COMPOSITION, AND METHODS FOR MANUFACTURING CURED RELIEF PATTERN AND SEMICONDUCTOR | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2013-07-04 | — | — | US | disclosed |
| US-20130168829-A1 | PHENOLIC RESIN COMPOSITION, AND METHODS FOR MANUFACTURING CURED RELIEF PATTERN AND SEMICONDUCTOR | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2013-07-04 | — | — | US | disclosed |
| US-8187788-B2 | Photosensitive resin composition and photosensitive film | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2012-05-29 | — | — | US | disclosed |
| US-20090191385-A1 | Photosensitive Resin Composition and Photosensitive Film | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2009-07-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260022202-A1 | UV-CURABLE COMPOSITION AND USE THEREOF | IDUA, SEM1, ARSA | RECQL 1300/4885MGLL 2293/4885ALDH1A1 232/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.