⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4425593 | 1.00 | — | — | |
| SCHEMBL4437740 | 0.80 | — | — | |
| SCHEMBL4437744 | 0.80 | — | — | |
| SCHEMBL4430854 | 0.79 | ALDH1A1 (0.41) | — | |
| SCHEMBL4430851 | 0.79 | ALDH1A1 (0.41) | — | |
| SCHEMBL4429155 | 0.78 | — | — | |
| SCHEMBL4430806 | 0.77 | — | — | |
| SCHEMBL4271384 | 0.76 | — | — | |
| SCHEMBL4437386 | 0.76 | ALDH1A1 (0.39) | — | |
| SCHEMBL4437389 | 0.76 | ALDH1A1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7544461-B2 | Near infrared ray activation type positive resin composition | KANSAI PAINT CO., LTD. (JP) | 2009-06-09 | — | — | US | disclosed |
| US-7358030-B2 | Process for producing ether compound | KYOWA YUKA CO., LTD. (JP) | 2008-04-15 | — | — | US | disclosed |
| US-20070259279-A1 | Near Infrared Ray Activation Type Positive Resin Composition | KANSAI PAINT CO., LTD. (JP) | 2007-11-08 | — | — | US | disclosed |
| EP-1788432-A1 | POSITIVE RESIN COMPOSITION OF NEAR-INFRARED-RAY ACTIVATION TYPE | Kansai Paint Co., Ltd. (JP) | 2007-05-23 | — | — | EP | disclosed |
| US-20060074262-A1 | Process for producing ether compound | KYOWA YUKA CO., LTD. (JP) | 2006-04-06 | — | — | US | disclosed |
| US-7015363-B2 | Process for producing ether compound | KYOWA YUKA CO., LTD. (JP) | 2006-03-21 | — | — | US | disclosed |
| US-20040181097-A1 | Process for producing ether compound | KYOWA YUKA CO., LTD. (JP) | 2004-09-16 | — | — | US | disclosed |
| EP-1415968-A1 | PROCESS FOR PRODUCING ETHER COMPOUND | Kyowa Yuka Co., Ltd. (JP) | 2004-05-06 | — | — | EP | disclosed |