Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PGK1 | P00558 | 4/20 | 0.52 |
| ▸ | PGK2 | P07205 | 4/20 | 0.52 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 2/20 | 0.32 |
| ▸ | MMP1 | P03956 | 2/20 | 0.32 |
| ▸ | MMP2 | P08253 | 2/20 | 0.32 |
| ▸ | MMP9 | P14780 | 2/20 | 0.32 |
| ▸ | MMP8 | P22894 | 2/20 | 0.32 |
| ▸ | MMP13 | P45452 | 2/20 | 0.32 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20558504 | 0.97 | PGK1 (0.50) | PGK1PGK2THRBCA1CA2 | |
| SCHEMBL20558582 | 0.97 | PGK1 (0.50) | PGK1PGK2THRBCA1CA2 | |
| SCHEMBL2944720 | 0.97 | PGK1 (0.50) | PGK1PGK2THRBCA1CA2 | |
| SCHEMBL2681324 | 0.97 | PGK1 (0.50) | PGK1PGK2THRBCA1CA2 | |
| SCHEMBL2783614 | 0.97 | PGK1 (0.50) | PGK1PGK2THRBCA1CA2 | |
| SCHEMBL234703 | 0.97 | PGK1 (0.50) | PGK1PGK2THRBCA1CA2 | |
| SCHEMBL11859908 | 0.97 | PGK1 (0.50) | PGK1PGK2THRBCA1CA2 | |
| Ammonia Solution, Strong SCHEMBL23493197 | 0.95 | PGK1 (0.48) | PGK1PGK2THRBCA1CA2 | |
| Ammonia Solution, Strong SCHEMBL1409101 | 0.95 | PGK1 (0.48) | PGK1PGK2THRBCA1CA2 | |
| Ammonia Solution, Strong SCHEMBL1408862 | 0.95 | PGK1 (0.48) | PGK1PGK2THRBCA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108369907-B | Liquid composition and method for surface treatment of semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2022-09-20 | — | — | CN | claimed |
| US-11094526-B2 | Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-08-17 | — | — | US | claimed |
| US-10745620-B2 | Reactive mesogen formulation with conductive additive | MERCK PATENT GMBH (DE) | 2020-08-18 | — | — | US | claimed |
| EP-3404700-B1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-05-13 | — | — | EP | claimed |
| US-20190019672-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-01-17 | — | — | US | claimed |
| EP-3404700-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-11-21 | — | — | EP | claimed |
| US-20170283699-A1 | REACTIVE MESOGEN FORMULATION WITH CONDUCTIVE ADDITIVE | MERCK PATENT GMBH (DE) | 2017-10-05 | — | — | US | claimed |
| EP-2812413-B1 | REACTIVE MESOGEN FORMULATION WITH CONDUCTIVE ADDITIVE | MERCK PATENT GMBH (DE) | 2016-03-16 | — | — | EP | claimed |
| US-20150008373-A1 | REACTIVE MESOGEN FORMULATION WITH CONDUCTIVE ADDITIVE | MERCK PATENT GMBH (DE) | 2015-01-08 | — | — | US | claimed |
| EP-0663378-B1 | Process for preparing of 2,2'-dimethyl-1, 1'-binaphthalene and 2,7'-Dimethyl-1,1'binaphthalene | HOECHST AG (DE) | 1999-03-31 | — | — | EP | claimed |
| US-5767333-A | ELECTROCHEMICAL OXIDATIVE DIMERIZATION OF 2-METHYLNAPHTHALENE | HOECHST AG (DE) | 1998-06-16 | — | — | US | claimed |
| EP-0675093-B1 | Process for preparing 4,4'-dimethyl-1,1'-binaphthyl | HOECHST AG (DE) | 1998-06-10 | — | — | EP | claimed |
| US-5522982-A | Process for preparing 4,4'-dimethyl-1,1'-binaphthyl | HOECHST AKTIENGESELLSCHAFT (DE) | 1996-06-04 | — | — | US | claimed |
| EP-0675093-A1 | Process for preparing 4,4'-dimethyl-1,1'-binaphthyl | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-10-04 | — | — | EP | claimed |
| EP-0663378-A1 | 2,7'-Dimethyl-1,1'-bioaphthalene and process for preparing of 2,2'-dimethyl-1,1'-binaphthalene and 2,7'-Dimethyl-1,1'binaphthalene | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-07-19 | — | — | EP | claimed |
| CN-109559980-B | Method of manufacturing integrated circuit device | 三星电子株式会社 | 2024-02-23 | — | — | CN | disclosed |
| CN-108369907-B | Liquid composition and method for surface treatment of semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2022-09-20 | — | — | CN | disclosed |
| US-5522982-A | Process for preparing 4,4'-dimethyl-1,1'-binaphthyl | HOECHST AKTIENGESELLSCHAFT (DE) | 1996-06-04 | — | — | US | disclosed |
| EP-0675093-A1 | Process for preparing 4,4'-dimethyl-1,1'-binaphthyl | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-10-04 | — | — | EP | disclosed |
| EP-0663378-A1 | 2,7'-Dimethyl-1,1'-bioaphthalene and process for preparing of 2,2'-dimethyl-1,1'-binaphthalene and 2,7'-Dimethyl-1,1'binaphthalene | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-07-19 | — | — | EP | disclosed |