Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 4/20 | 0.60 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.60 |
| ▸ | FYN | P06241 | 1/20 | 0.60 |
| ▸ | MAOA | P21397 | 1/20 | 0.60 |
| ▸ | ACHE | P22303 | 1/20 | 0.60 |
| ▸ | AHR | P35869 | 1/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 8/20 | 0.47 |
| ▸ | HPGD | P15428 | 7/20 | 0.47 |
| ▸ | TSHR | P16473 | 5/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.47 |
| ▸ | CASP1 | P29466 | 2/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.47 |
| ▸ | CASP7 | P55210 | 1/20 | 0.47 |
| ▸ | THRB | P10828 | 1/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | CYP1B1 | Q16678 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28715074 | 0.95 | CYP1A2 (0.55) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL21708810 | 0.93 | CYP1A2 (0.56) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL27567812 | 0.91 | CYP1A2 (0.55) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL28476963 | 0.91 | CYP1A2 (0.53) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL5334139 | 0.86 | ALDH1A1 (0.56) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL30075940 | 0.84 | ALDH1A1 (0.56) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL14322660 | 0.84 | ALDH1A1 (0.56) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL27927260 | 0.84 | CYP1A2 (0.55) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL2956150 | 0.83 | ALDH1A1 (0.64) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL29354014 | 0.83 | ALDH1A1 (0.50) | CYP1A2ERBB2FYNMAOAACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8846846-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-30 | — | — | US | claimed |
| US-20120064725-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-15 | — | — | US | claimed |
| US-20110136282-A1 | METHOD FOR PRODUCING DEVICE | TORAY INDUSTRIES, INC. (JP) | 2011-06-09 | — | — | US | claimed |
| EP-2309823-A1 | METHOD FOR PRODUCING DEVICE | Toray Industries, Inc. (JP) | 2011-04-13 | — | — | EP | claimed |
| US-9045587-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140363768-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8846846-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-30 | — | — | US | disclosed |
| US-20120064725-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-15 | — | — | US | disclosed |
| CN-102113413-A | Method for producing device | — | 2011-06-29 | — | — | CN | disclosed |
| US-20110136282-A1 | METHOD FOR PRODUCING DEVICE | TORAY INDUSTRIES, INC. (JP) | 2011-06-09 | — | — | US | disclosed |
| EP-2309823-A1 | METHOD FOR PRODUCING DEVICE | Toray Industries, Inc. (JP) | 2011-04-13 | — | — | EP | disclosed |