SCHEMBL4433537

SCHEMBL4433537

O=C(Cc1ccccc1O)Nc1ccccc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.67
CYP2D6 P10635 2/20 0.67
CYP2C9 P11712 2/20 0.67
CYP2C19 P33261 2/20 0.67
AKR1B1 P15121 1/20 0.62
EPHX2 P34913 1/20 0.61
HIF1A Q16665 1/20 0.61
MEN1 O00255 2/20 0.54
KMT2A Q03164 2/20 0.54
BCAT2 O15382 1/20 0.53
L3MBTL1 Q9Y468 2/20 0.51
CA12 O43570 1/20 0.51
CA1 P00915 1/20 0.51
CA2 P00918 1/20 0.51
CA9 Q16790 1/20 0.51
KDM4E B2RXH2 2/20 0.50
LMNA P02545 2/20 0.50
HSD17B10 Q99714 2/20 0.50
MAPT P10636 2/20 0.50
CYP3A4 P08684 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21198560 0.85 POLB (0.56) MEN1KMT2AL3MBTL1SMN1; SMN2ANO1
SCHEMBL31306634 0.85 POLB (0.56) MEN1KMT2AL3MBTL1SMN1; SMN2ANO1
SCHEMBL28044791 0.83 HIF1A (0.59) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
SCHEMBL8370172 0.82 KCNJ5 (0.76) MEN1KMT2ALMNAHSD17B10MAPT
SCHEMBL9620622 0.82 AKR1B1 (0.58) CYP1A2CYP2D6CYP2C9CYP2C19AKR1B1
SCHEMBL9181408 0.82 CYP1A2 (0.48) CYP1A2CYP2D6CYP2C9CYP2C19AKR1B1
SCHEMBL14088983 0.81 KMT2A (0.58) CYP1A2CYP2D6CYP2C9CYP2C19AKR1B1
SCHEMBL7890138 0.81 MEN1 (0.57) MEN1KMT2ALMNAMAPTSMN1; SMN2
SCHEMBL18416960 0.81 NLRP3 (0.56) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
SCHEMBL25148983 0.80 CYP2C9 (0.65) CYP1A2CYP2D6CYP2C9CYP2C19EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8187788-B2 Photosensitive resin composition and photosensitive film ASAHI KASEI KABUSHIKI KAISHA (JP) 2012-05-29 US disclosed
US-20090191385-A1 Photosensitive Resin Composition and Photosensitive Film ASAHI KASEI KABUSHIKI KAISHA (JP) 2009-07-30 US disclosed