SCHEMBL4434932

SCHEMBL4434932

CCOC(CC)NF

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1487867 0.77
SCHEMBL9230467 0.77 THRB (0.42)
SCHEMBL11851476 0.74
SCHEMBL19558772 0.74
Hydrochloric Acid SCHEMBL27750865 0.72
Methylamine SCHEMBL770382 0.72 THRB (0.38)
SCHEMBL29148294 0.72
SCHEMBL19695734 0.72
SCHEMBL14016005 0.72
SCHEMBL8789972 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2954373-A1 CHEMICAL COATING FOR A LASER-MARKABLE MATERIAL Fujifilm Hunt Chemicals US, Inc. (US) 2015-12-16 EP disclosed
WO-2014124052-A1 CHEMICAL COATING FOR A LASER-MARKABLE MATERIAL FUJIFILM HUNT CHEMICALS, INC. (US) 2014-08-14 WO disclosed
EP-2064069-A1 COATING COMPOSITION FOR FORMING A LASER-MARKABLE MATERIAL AND A LASER-MARKABLE MATERIAL FUJI HUNT PHOTOGRAPHIC CHEMICALS, INC. (US) 2009-06-03 EP disclosed
WO-2007114829-A1 COATING COMPOSITION FOR FORMING A LASER-MARKABLE MATERIAL AND A LASER-MARKABLE MATERIAL FUJI HUNT PHOTOGRAPHIC CHEMICALS, INC. (US) 2007-10-11 WO disclosed
EP-1297967-B1 Thermal recording material and production method thereof FUJI PHOTO FILM CO LTD (JP) 2006-07-19 EP disclosed