SCHEMBL443617

SCHEMBL443617

c1ccc2cc3c(Oc4cccc5ccccc45)cccc3cc2c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.48
HSD17B10 Q99714 4/20 0.48
HIF1A Q16665 1/20 0.48
CYP1B1 Q16678 1/20 0.48
HTR1B P28222 4/20 0.47
KCNA3 P22001 1/20 0.46
SIRT2 Q8IXJ6 1/20 0.45
SIRT1 Q96EB6 1/20 0.45
SIRT3 Q9NTG7 1/20 0.45
ESRRA P11474 1/20 0.43
NQO1 P15559 1/20 0.42
KDM4E B2RXH2 4/20 0.42
HPGD P15428 3/20 0.42
TDP1 Q9NUW8 1/20 0.42
GAA P10253 3/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
MAPT P10636 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
CYP1A2 P05177 1/20 0.41
OGG1 O15527 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1783813 0.94 NQO1 (0.46) ALDH1A1HSD17B10HIF1ACYP1B1HTR1B
Lithium SCHEMBL6571294 0.91 NQO1 (0.45) ALDH1A1HSD17B10HIF1ACYP1B1HTR1B
SCHEMBL9616917 0.91 NQO1 (0.45) ALDH1A1HSD17B10HIF1ACYP1B1HTR1B
SCHEMBL31474285 0.91 NQO1 (0.45) ALDH1A1HSD17B10HIF1ACYP1B1HTR1B
SCHEMBL2555609 0.88 ALDH1A1 (0.48) ALDH1A1HSD17B10HIF1ACYP1B1HTR1B
SCHEMBL29385434 0.88 ALDH1A1 (0.48) ALDH1A1HSD17B10HIF1ACYP1B1HTR1B
SCHEMBL258664 0.88 ALDH1A1 (0.48) ALDH1A1HSD17B10HIF1ACYP1B1HTR1B
SCHEMBL29577853 0.87 HTR1B (0.54) ALDH1A1HSD17B10HTR1BKCNA3ESRRA
SCHEMBL442767 0.87 HTR1B (0.54) ALDH1A1HSD17B10HTR1BKCNA3ESRRA
SCHEMBL3464859 0.85 GAA (0.46) ALDH1A1HSD17B10HIF1ACYP1B1HTR1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846846-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-30 US claimed
US-20120064725-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-15 US claimed
US-9045587-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-02 US disclosed
US-20140363768-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-11 US disclosed
US-8846846-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-30 US disclosed
US-20120064725-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-15 US disclosed
CN-1301239-C Process for producing anthracene diether KAWASAKI KASEI CHEMICALS (JP) 2007-02-21 CN disclosed
CN-1714065-A Process for producing anthracene diether KAWASAKI KASEI CHEMICALS (JP) 2005-12-28 CN disclosed