Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.59 |
| ▸ | THRB | P10828 | 1/20 | 0.59 |
| ▸ | HTT | P42858 | 1/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.59 |
| ▸ | MAPT | P10636 | 1/20 | 0.59 |
| ▸ | TSHR | P16473 | 4/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.45 |
| ▸ | CES2 | O00748 | 2/20 | 0.43 |
| ▸ | HCAR2 | Q8TDS4 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | PLA2G2C | Q5R387 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL28161015 | 0.93 | MEN1 (0.48) | MEN1THRBHTTKMT2AMAPT | |
| Triethylene Glycol SCHEMBL8462921 | 0.93 | MEN1 (0.69) | MEN1THRBHTTKMT2AMAPT | |
| Acrylic Acid SCHEMBL3677604 | 0.92 | MEN1 (0.50) | MEN1THRBHTTKMT2AMAPT | |
| Acrylic Acid SCHEMBL4287572 | 0.92 | CES2 (0.50) | MEN1THRBHTTKMT2AMAPT | |
| Acrylic Acid SCHEMBL27717763 | 0.90 | MEN1 (0.57) | MEN1THRBHTTKMT2AMAPT | |
| Di(Hydroxyethyl)Ether SCHEMBL9306495 | 0.88 | TSHR (0.65) | MEN1THRBHTTKMT2AMAPT | |
| Acrylic Acid SCHEMBL30487679 | 0.88 | CES2 (0.53) | MEN1THRBHTTKMT2AMAPT | |
| Acrylic Acid SCHEMBL29508299 | 0.88 | CES2 (0.53) | MEN1THRBHTTKMT2AMAPT | |
| Acrylic Acid SCHEMBL28031949 | 0.88 | CES2 (0.53) | MEN1THRBHTTKMT2AMAPT | |
| Acrylic Acid SCHEMBL27560702 | 0.88 | CES2 (0.53) | MEN1THRBHTTKMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110237151-A | A kind of surface surgical anesthesia face-mask material and preparation method thereof | 李会娟 | 2019-09-17 | — | — | CN | disclosed |
| CN-101437692-B | Printing spacer material | ASAHI CHEMICAL CORP (JP) | 2011-02-02 | — | — | CN | disclosed |
| CN-101627339-A | Photosensitive resin composition, flexographic printing plate, and method for producing flexographic printing plate | ASAHI CHEMICAL CORP (JP) | 2010-01-13 | — | — | CN | disclosed |
| US-7592540-B2 | di(ethylene glycol) 2-ethylhexyl ether acrylate monomer, photoinitiator (benzoylperoxide), and lithium salt (LiPF6); suppresses volatilization of redox electrolyte and provides stable photoelectrochemical properties against environmental changes; high voltage and high photoelectric conversion efficiency | SAMSUNG SDI CO., LTD. (KR) | 2009-09-22 | — | — | US | disclosed |
| CN-101437692-A | Printing spacer material | ASAHI CHEMICAL CORP (JP) | 2009-05-20 | — | — | CN | disclosed |
| EP-1724871-B1 | Composition for Preparing Polymer Electrolyte for use in Dye-Sensitized Solar Cell | SAMSUNG SDI CO LTD (KR) | 2009-03-04 | — | — | EP | disclosed |
| EP-1724871-A1 | Composition for Preparing Polymer Electrolyte for use in Dye-Sensitized Solar Cell | Samsung SDI Co., Ltd. (KR) | 2006-11-22 | — | — | EP | disclosed |
| US-20060254640-A1 | di(ethylene glycol) 2-ethylhexyl ether acrylate monomer, photoinitiator (benzoylperoxide), and lithium salt (LiPF6); suppresses volatilization of redox electrolyte and provides stable photoelectrochemical properties against environmental changes; high voltage and high photoelectric conversion efficiency | SAMSUNG SDI CO., LTD. (KR) | 2006-11-16 | — | — | US | disclosed |
| EP-0604949-B1 | Actinic-radiation-curing hot-melt pressure-sensitive adhesive composition | MITSUI TOATSU CHEMICALS (JP) | 1996-10-23 | — | — | EP | disclosed |
| US-5384341-A | Melt viscosity stability, coating workability | MITSUI TOATSU CHEMICALS, INC. (JP) | 1995-01-24 | — | — | US | disclosed |
| EP-0604949-A2 | Actinic-radiation-curing hot-melt pressure-sensitive adhesive composition | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1994-07-06 | — | — | EP | disclosed |