⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4437726 | 1.00 | — | — | |
| SCHEMBL28168752 | 0.78 | ALDH1A1 (0.32) | — | |
| SCHEMBL8582815 | 0.75 | — | — | |
| SCHEMBL7754341 | 0.75 | — | — | |
| SCHEMBL11997969 | 0.75 | — | — | |
| SCHEMBL4430036 | 0.73 | — | — | |
| SCHEMBL7754339 | 0.73 | — | — | |
| SCHEMBL7754336 | 0.73 | — | — | |
| SCHEMBL4430034 | 0.73 | — | — | |
| SCHEMBL10270221 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9856340-B2 | Photocurable fluorinated polymer composition | ASAHI GLASS COMPANY, LIMITED (JP) | 2018-01-02 | — | — | US | disclosed |
| EP-2468816-B1 | PHOTOCURABLE FLUORINATED POLYMER COMPOSITION | ASAHI GLASS CO LTD (JP) | 2014-11-26 | — | — | EP | disclosed |
| US-8796193-B2 | Refrigerating machine oil compositions | NIPPON OIL CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| EP-2468816-A1 | PHOTOCURABLE FLUORINATED POLYMER COMPOSITION | Asahi Glass Company, Limited (JP) | 2012-06-27 | — | — | EP | disclosed |
| US-20120149798-A1 | PHOTOCURABLE FLUORINATED POLYMER COMPOSITION | ASAHI GLASS COMPANY, LIMITED (JP) | 2012-06-14 | — | — | US | disclosed |
| US-7544461-B2 | Near infrared ray activation type positive resin composition | KANSAI PAINT CO., LTD. (JP) | 2009-06-09 | — | — | US | disclosed |
| US-7358030-B2 | Process for producing ether compound | KYOWA YUKA CO., LTD. (JP) | 2008-04-15 | — | — | US | disclosed |
| US-20070259279-A1 | Near Infrared Ray Activation Type Positive Resin Composition | KANSAI PAINT CO., LTD. (JP) | 2007-11-08 | — | — | US | disclosed |
| CN-101027609-A | Positive resin composition of near-infrared-ray activation type | KANSAI PAINT CO LTD (JP) | 2007-08-29 | — | — | CN | disclosed |
| US-20070155635-A1 | Refrigerating machine oil compositions | NIPPON OIL CORPORATION (JP) | 2007-07-05 | — | — | US | disclosed |
| EP-1788432-A1 | POSITIVE RESIN COMPOSITION OF NEAR-INFRARED-RAY ACTIVATION TYPE | Kansai Paint Co., Ltd. (JP) | 2007-05-23 | — | — | EP | disclosed |
| US-20060074262-A1 | Process for producing ether compound | KYOWA YUKA CO., LTD. (JP) | 2006-04-06 | — | — | US | disclosed |
| US-7015363-B2 | Process for producing ether compound | KYOWA YUKA CO., LTD. (JP) | 2006-03-21 | — | — | US | disclosed |
| US-20040181097-A1 | Process for producing ether compound | KYOWA YUKA CO., LTD. (JP) | 2004-09-16 | — | — | US | disclosed |
| EP-1415968-A1 | PROCESS FOR PRODUCING ETHER COMPOUND | Kyowa Yuka Co., Ltd. (JP) | 2004-05-06 | — | — | EP | disclosed |
| US-4983501-A | Water-insoluble binder, compound forming strong acid on irradiation, acetal, relief image formation | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-01-08 | — | — | US | disclosed |
| EP-0355581-A2 | Positive photosensitive mixture, and photosensitive registration material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-02-28 | — | — | EP | disclosed |